Manufacturing method for resin sealed semiconductor device

1. A semiconductor device manufacturing method comprising the steps of:

providing a conductive board having opposed front and back sides;

conducting half etching of the front side of the conductive board to form a plurality of sets of a die pad portion and bonding areas on the conductive board, the sets being arranged in rows on the conductive board, and the half etching being conducted between the die pad portion and the bonding areas of each set but not between adjoined bonding areas of adjacent die pad portions along the rows;

mounting a semiconductor chip on the die pad portion of each set using a conductive paste;

connecting electrodes on the respective semiconductor chips and the bonding areas of the respective sets to each other electrically with metal wires;

sealing a mounting portion of each semiconductor chip, the bonding areas connected thereto and the front side of the conductive board with a continuous molding resin to form a resin-sealed body;

removing the conductive board selectively from the back side to leave the die pad portion and the bonding areas of each set so that the die pad portion and the bonding areas protrude from a bottom surface of the resin-sealed body; and

separating the resin-sealed body into individual semiconductor devices by cutting through the molding resin and the adjoined bonding areas.

2. A semiconductor device manufacturing method according to claim 1 , wherein the conductive board is made of a metal including one of copper and Fe-42% Ni.

3. A semiconductor device manufacturing method according to claim 1 , wherein the step of electrically connecting the electrodes on the semiconductor chip and the bonding areas to each other includes wire bonding using one of a gold wire, a copper wire, and an aluminum wire.

4. A semiconductor device manufacturing method according to claim 1 , wherein the step of sealing the mounting portion with the molding resin includes one of potting and transfer molding.

5. A semiconductor device manufacturing method according to claim 1 , wherein the step of removing the conductive board selectively from the back side to leave the die pad portion and the bonding areas of each set so that the die pad portion and the bonding areas protrude from the resin-sealed body includes etching.

6. A semiconductor device manufacturing method according to claim 1 , wherein the step of separating the resin sealed body into individual semiconductor devices includes dicing.

7. A semiconductor device manufacturing method according to claim 1 wherein the removing step comprises applying a photo-resist to the back side of the conductive board; patterning the photo-resist; and removing the conductive board from the back side by etching, using the patterned photo-resist, so that the die pad portions and the bonding areas protrude from the bottom surface of the resin-sealed body.

8. A semiconductor device manufacturing method, composing the steps of;

providing a conductive board having opposed front and back surfaces;

etching the front side of the conductive board to form plural sets of a die pad portion and bonding areas on the conductive board, the bonding areas situated between adjacent die pad portions of adjacent sets being adjoined, and each set corresponding to one semiconductor device;

mounting semiconductor chips having electrodes on respective ones of the die pad portions using conductive paste;

connecting the electrodes of the respective semiconductor chips to the bonding areas of the respective sets with metal wires;

sealing the front side of the conductive board including the semiconductor chips, the bonding areas and the metal wires with a molding resin to form a resin-sealed body;

removing the conductive board selectively from the back side to leave the die pad portion and the bonding areas of the plural sets so that the die pad portion and the bonding areas protrude from a bottom surface of the resin-sealed body; and then

separating the resin-sealed body into individual semiconductor devices by cutting through the molding resin and the adjoined bonding areas.

9. A semiconductor device manufacturing method according to claim 8 , wherein the connecting step comprising wire bonding the electrodes to the bonding areas using one of gold wire, copper and aluminum wire.

10. A semiconductor device manufacturing method according to claim 8 , wherein the sealing step is carried out using one of potting and transfer molding.

11. A semiconductor device manufacturing method according to claim 8 , wherein the removing step is carried out by etching.

12. A semiconductor device manufacturing method according to claim 8 , wherein the removing step comprises applying a photo-resist to the back side of the conductive board; patterning the photo-resist; and removing the conductive board from the back side by etching, using the patterned photo-resist, so that the die pad portions and the bonding areas protrude from the bottom surface of the resin-sealed body.