Transflective liquid crystal display device having a color filter and method for fabricating thereof
View Patent ↗A color filter substrate for a liquid crystal display device and method of fabricating the color filter substrate are provided. The color filter substrate includes a base substrate having a transmissive portion and a reflective portion, the transmissive portion having a groove, a color filter layer on the base substrate, and a black matrix on the color filter layer.
1. A method of fabricating a color filter substrate for a liquid crystal display device, comprising:
forming an opaque metal pattern on a base substrate, the base substrate having a transmissive portion and a reflective portion, the opaque metal pattern being formed at the reflective portion;
forming a groove at the transmissive portion by selectively removing the base substrate using the opaque metal pattern as a mask;
forming a black matrix on the base substrate by selectively removing the opaque metal pattern; and
forming a color filter layer of a first color on the black matrix and on the base substrate.
2. The method according to claim 1 , further comprising forming color filter layers of second and third colors on the black matrix and on the base substrate.
3. A method of fabricating a color filter substrate for a liquid crystal display device, comprising:
forming a black matrix on a base substrate, the base substrate having a transmissive portion and a reflective portion;
forming a plurality of buffer patterns at the reflective portion, the plurality of buffer patterns having a concave portion and a convex portion; and
forming a color filter layer at the transmissive and reflective portions,
wherein a thickness of the color filter in a first region of at the reflective portion is different from a thickness of the color filter in a second region at the reflective portion,
wherein a top surface of the concave portion is located higher than a top surface of the base substrate and a bottom surface of the concave portion contacts the top surface of the base substrate.
4. The method according to claim 3 , wherein the plurality of buffer patterns have a uniform pitch.
5. The method according to claim 4 , wherein the pitch is within a range of about 14 to 45 micrometers.
6. The method according to claim 3 , wherein the plurality of buffer patterns are formed by depositing and selectively removing a transparent material.
7. The method according to claim 6 , wherein the plurality of buffer patterns are formed of one of benzocyclobutene, acrylic resin and silicon nitride.