Method for making thin-film semiconductor device
View Patent ↗A method for making a thin-film semiconductor device includes an annealing step of irradiating an amorphous semiconductor thin film with a laser beam so as to crystallize the amorphous semiconductor thin film. In the annealing step, the semiconductor thin film is continuously irradiated with the laser beam while shifting the position of the semiconductor thin film irradiated with the laser beam at a predetermined velocity so that excess hydrogen can be removed from the region irradiated with the laser beam without evaporating and expanding hydrogen ions in the semiconductor thin film.
1. A method for making a thin-film semiconductor device, the method comprising:
an annealing step of irradiating an amorphous semiconductor thin film with a laser beam so as to crystallize the amorphous semiconductor thin film,
wherein, in the annealing step, the semiconductor thin film is continuously irradiated with the laser beam while shifting the position of the semiconductor thin film irradiated with the laser beam at a predetermined velocity so that excess hydrogen can be removed from the region irradiated with the laser beam without evaporating and expanding hydrogen ions in the semiconductor thin film, and
wherein in the annealing step, the excess hydrogen travels inside the semiconductor thin film along with the shifting of the region irradiated with the laser beam and is precipitated in the region of the semiconductor thin film at which the irradiation with the laser beam is terminated.
2. The method according to claim 1 , wherein, in the annealing step, the laser beam has a wavelength of 350 nm to 470 nm.
3. The method according to claim 1 , wherein, in the annealing step, the laser beam is generated by a GaN compound semiconductor laser oscillator.
4. The method according to claim 1 , wherein, in the annealing step, only a selected region in the semiconductor thin film is continuously irradiated with the laser beam.
5. The method according to claim 4 , wherein the semiconductor thin film is patterned to include the selected region.
6. The method according to claim 4 , wherein, in the annealing step, a plurality of the selected regions in the semiconductor thin film are simultaneously irradiated.
7. The method according to claim 1 , wherein, in the annealing step, the velocity of the shifting laser beam is adjusted to 0.1 m/sec to 10 m/sec.
8. The method according to claim 1 , wherein, in the annealing step, the laser beam has a spot diameter not exceeding 10 μm on the semiconductor thin film.
9. The method according to claim 1 , wherein the semiconductor thin film is disposed on a plastic substrate.