IP Library Granted Patent US 8,807,145
Granted Patent B2
US 8,807,145 · App. 11/894,486 · Granted Aug 19, 2014

Artificial nail and method of forming same

Inventor: Kyu Sang Han (Port Washington, NY)
Assignee: Kiss Nail Products, Inc.
A45D31/00B29C45/00
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Quick Facts
Patent No.
US 8,807,145
App. No.
11/894,486
Granted
Aug 19, 2014
Kind
B2
Abstract

An artificial nail is formed by injection molding a first section and a second section. The first section and second section are adjacent to one another. One of the sections defines a front distal tip of the artificial nail and is formed by injecting a quantity of heated material under pressure from a nozzle into a sprue, through a runner and through a cavity gate into a mold cavity. The other section is formed by injecting another quantity of heated material under pressure from a heated nozzle through another cavity gate into the mold cavity.

Claims (11)

1. A method for providing an artificial nail comprising:

injection molding a first section of the artificial nail by a runner system injection molding process;

hot tip gate injection molding a second section of the artificial nail;

forming a gate vestige on a bottom surface of the second section; and

arranging the second section adjacent to the first section, wherein the first section defines a front distal tip of the artificial nail.

2. The method according to claim 1 , wherein the step of forming a gate vestige on a bottom surface of the second section comprises forming a gate vestige having a thickness of 0.005 inches.

3. The method according to claim 1 , further comprising

forming a combined arrangement from the first and second sections, wherein the combined arrangement has a distal end and a proximal end, the proximal end being configured to be provided at a cuticle portion of a natural nail, the distal end being configured to be provided at a front portion of the natural nail which is opposite to and away from the cuticle portion, and

wherein a first thickness of the arrangement at the proximal end is smaller than a second thickness of the arrangement at the distal end.

4. The method according to claim 1 , wherein the second section includes a first portion at a first location through which a hot tip gate injection mold has been provided, wherein the first section includes a second portion at a second location through which a runner system injection mold has been provided, and wherein the first location is vertically closer to a further location on a natural nail to which the artificial nail is configured to be applied than the second location.

5. The method according to claim 1 , further comprising forming a combined arrangement from the first and second sections, wherein the second section has a particular end provided opposite to a cuticle portion of a natural nail, and wherein the first section overlaps the second section at the particular end.

Assignments (2)
SECURITY INTEREST Recorded May 14, 2018
From: KISS NAIL PRODUCTS, INC.
To: CITIBANK, N.A.
Reel/Frame 046714/0535 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 13, 2010
From: HAN, KYU SANG
To: KISS NAIL PRODUCTS, INC.
Reel/Frame 024976/0027 →
Continuity (12)
Continuation 11473251 · Jun 22, 2006
Continuation In Part 10348718 · Jan 22, 2003
Continuation In Part 10281500 · Oct 28, 2002
Continuation In Part 11894486
Continuation In Part 10641986 · Aug 15, 2003
Continuation In Part 10348718
Continuation In Part 10281500
Continuation In Part 11894486
Continuation In Part 11041182 · Jan 20, 2005
Continuation In Part 10348718
Continuation In Part 10641986
Related Publication 20080017211A1 · Jan 24, 2008