Substrate cleaning apparatus and substrate cleaning method using the same
View Patent ↗Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.
1. A substrate cleaning method using a substrate cleaning apparatus, the substrate cleaning apparatus including, a brush cleaning unit which cleans a substrate by making a roll brush in, contact with a surface of the substrate, and a transporting unit which conveys the substrate, the roll brush including a bristle, and at least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becoming larger from an end portion of the roll brush to a central portion thereof, the substrate cleaning method comprising:
pressing the roll brush to the substrate with a predetermined pressure, the roll brush rotating; and contacting the surface of the substrate with the roll brush with a uniform pressure; and deforming the surface of the substrate according to the contact with the roll brush; and
spraying a predetermined fluid to the substrate, which is held by a holding means.