Spine distraction implant and method

1. An apparatus comprising:

an implant having a support member and a retention member, at least a portion of the support member sized to define a minimum space between first and second adjacent spinous processes of a human spine when placed between the spinous processes;

the support member having a proximal end and a distal end and wherein the support member continuously narrows in cross-section in a direction from the proximal end to the distal end;

the retention member movably coupled to the support member at a location between the proximal and distal ends; the retention member configured to move relative to the support member between a first position and a second position, the retention member configured to limit lateral movement of the support member relative to the pair of adjacent spinous processes when in the second position;

wherein the retention member is rotatably coupled to the support member at a pivot point longitudinally spaced away from both the distal and proximal ends of the support member in both the first and second positions;

wherein the retention member is longitudinally located between the proximal end and the distal end of the support member in the second position;

wherein the support member has a triangular cross-sectional configuration;

wherein the retention member has a teardrop-shaped cross-sectional configuration; and

wherein a second retention member identical to the retention member is rotatably coupled to the support member such that each retention member along with a sloping surface of the triangular configuration form a recess for reception of a spinous process.

2. The apparatus of claim 1 , wherein the distal end of the support member includes a tapered outer surface configured to distract the pair of adjacent spinous processes.

3. The apparatus of claim 1 , wherein:

the retention member is configured to not limit lateral movement of the support member relative to the adjacent spinous processes when in the first position.

4. An apparatus comprising:

an implant having a support member and a retention member, at least a portion of the support member sized to define a minimum space between first and second adjacent spinous processes of a human spine when placed between the spinous processes;

the support member having a proximal end and a distal end and wherein the support member continuously narrows in cross-section in a direction from the proximal end to the distal end;

the retention member movably coupled to the support member at a pivot point, the retention member configured to move relative to the support member between a first position and a second position, the retention member configured to limit lateral movement of the support member relative to the pair of adjacent spinous processes when in the second position;

wherein the retention member is movably coupled to the support member at a position located between the proximal and distal ends and longitudinally spaced away from both the distal and proximal ends of the support member in both the first and second positions;

wherein a portion of the retention member is positioned within a profile the support member when in the first position;

wherein the portion of the retention member is positioned outside of the profile of the support member when in the second position;

wherein the support member has a triangular cross-sectional configuration;

wherein the retention member has a teardrop-shaped cross-sectional configuration; and

wherein a second retention member identical to the retention member is rotatably coupled to the support member such that each retention member along with a sloping surface of the triangular configuration form a recess for reception of a spinous process.

5. An interspinous device comprising:

an implant configured to distract apart an upper and lower spinous process when the implant is inserted between the upper and lower spinous processes;

the implant having a proximal end and a distal end and wherein the implant continuously narrows in cross-section in a direction from the proximal end to the distal end of the implant;

a locking mechanism coupled to the implant between the proximal and distal ends of the implant, the locking mechanism moveable between a retracted position and a deployed position;

the locking mechanism having a distal end and a proximal end; the distal end of the locking mechanism being a portion of the locking mechanism disposed farthest away from the proximal end of the implant;

wherein when the locking mechanism is in the retracted position, a distal end of the locking mechanism is closer to the implant than when the locking mechanism is in the deployed position;

wherein the distal end of the implant is disposed beyond the locking mechanism when the locking mechanism is in the deployed position;

wherein when the implant is disposed between the upper and lower spinous processes and the locking mechanism is in the deployed position, the locking mechanism is configured to inhibit lateral motion of the implant relative to the spinous processes;

wherein the implant has a triangular cross-sectional configuration;

wherein the retention member has a teardrop-shaped cross-sectional configuration; and

wherein a second retention member identical to the retention member is rotatably coupled to the implant such that each retention member along with a sloping surface of the triangular configuration form a recess for reception of a spinous process.

6. The apparatus of claim 1 , wherein the distal end defines a sharp, pointed tip.

7. The apparatus of claim 1 , wherein the retention member is continuously tapered between a first end adjacent the pivot point and a tip of an opposite second end of the retention member.

8. The apparatus of claim 4 , wherein the distal end defines a sharp, pointed tip.

9. The apparatus of claim 4 , wherein the retention member is continuously tapered between a first end adjacent the pivot point and a tip of an opposite second end of the retention member.