Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part
View Patent ↗In a formation method for forming a fine structure in a workpiece ( 30 ) containing an etching control component, using an isotropic etching process, a mask ( 32, 34 ) having an opening ( 36 ) is applied to the workpiece, and the workpiece is etched with an etching solution ( 38 ) to thereby form a recess ( 40 ), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.
1. A matrix for molding a micro-lens array, the matrix comprising:
a glass substrate having an array of hemisphere-like recesses formed therein,
wherein said glass substrate contains at least one etching control component at a concentration which causes an elution of said etching control component from said glass substrate when being subjected to an isotropic etching process using an etching solution for the formation of said hemisphere-like recesses in said glass substrate,
wherein said isotropic etching process comprises:
applying a mask having an array of openings to said glass substrate; and
etching said glass substrate with said etching solution so that said array of hemisphere-like recesses is formed so as to correspond to said array of openings, the etching of said glass substrate being allowed to continue until the etching is stopped when the etching control component eluted out said glass substrate in the etching solution accumulates on inner surfaces of said hemisphere-like recesses so that the inner surfaces of said hemisphere-like recesses are prevented from contacting a fresh part of the etching solution.
2. A matrix as set forth in claim 1 , wherein said etching control component is composed of at least one selected from the group consisting of aluminum oxide, magnesium oxide, calcium oxide, potassium oxide, strontium oxide, barium oxide, lithium oxide, sodium oxide, cesium oxide, zinc oxide, and lead oxide.
3. A matrix as set forth in claim 1 , wherein said etching control component of said glass substrate is at least 35% in weight.