Method for manufacturing a perpendicular magnetic write head

1. A method for manufacturing a magnetic write head for perpendicular magnetic data recording, comprising:

providing a substrate;

forming a write pole over the substrate with a thin alumina hard mask over a trailing edge of the write pole;

depositing a RIEable material;

forming a mask over the write pole, thin alumina hard mask and RIEable material, the mask having a back edge that defines a secondary flare point location;

performing a reactive ion etch (RIE) to remove the RIEable material in an area not protected by the mask;

performing an ion milling to remove the thin alumina hard mask in an area not protected by the mask; and

performing a sweeping ion beam deposition to deposit a magnetic material onto portions of the write pole that are not protected by the mask, the sweeping ion beam deposition being performed at an angle relative to normal so that shadowing from the mask forms a stitched magnetic pole with a tapered front edge.

2. The method as in claim 1 further comprising, performing a lapping operation to form an air bearing surface, and wherein the tapered surface of the stitched magnetic pole is formed at an angle relative to the air bearing surface.

3. The method as in claim 1 further comprising:

removing the mask;

depositing a non-magnetic material; and

forming a magnetic trailing shield over the non-magnetic material.

4. The method as in claim 1 further comprising:

removing the mask;

depositing alumina;

performing an ion milling to remove horizontally disposed portions of the alumina;

depositing Rh; and

depositing a magnetic trailing shield.

5. The method as in claim 1 wherein the RIEable material comprises a material selected from the group consisting of Si—C and Si—N.

6. The method as in claim 1 wherein the reactive ion etching produces an undercut in the non-magnetic RIEable material.