Silica glass containing TiO
View Patent ↗A silica glass containing TiO 2 , which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO 2 , which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.
1. A silica glass comprising TiO2, which has a fictive temperature of at most 1,000° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
2. A silica glass comprising TiO2, which has a fictive temperature of at most 1,000° C., a F concentration of at least 500 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.
3. The silica glass comprising TiO2 according to claim 1 , which has a coefficient of thermal expansion of 0±150 ppb/° C. from 0 to 100° C.
4. The silica glass comprising TiO2 according to claim 1 , which has a F concentration of at least 1,000 ppm.
5. The silica glass comprising TiO2 according to claim 1 , which exhibits a fluctuation of the refractive index (Δn) of at most 2×10−4 within an area of 30 mm×30 mm in at least one plane.
6. The silica glass comprising TiO2 according to claim 2 , which has a coefficient of thermal expansion of 0±150 ppb/° C. from 0 to 100° C.
7. The silica glass comprising TiO2 according to claim 2 , which has a F concentration of at least 1,000 ppm.
8. The silica glass comprising TiO2 according to claim 2 , which exhibits a fluctuation of the refractive index (Δn) of at most 2×10−4 within an area of 30 mm×30 mm in at least one plane.
9. The silica glass according to claim 1 , which exhibits a temperature width wherein the coefficient of thermal expansion becomes 0±5 ppb/° C. of at least 4.5° C.
10. The silica glass according to claim 9 , which exhibits a temperature width wherein the coefficient of thermal expansion becomes 0±5 ppb/° C. of at least 5.0° C.
11. The silica glass according to claim 9 , which exhibits a temperature width wherein the coefficient of thermal expansion becomes 0±5 ppb/° C. of at least 6.0° C.
12. An EUVL exposure device comprising the silica glass according to claim 9 , wherein said glass is an optical material.
13. An EUVL exposure device comprising the silica glass according to claim 10 , wherein said glass is an optical material.
14. An EUVL exposure device comprising the silica glass according to claim 11 , wherein said glass is an optical material.