Smooth electrode and method of fabricating same
View Patent ↗A smooth electrode is provided. The smooth electrode includes at least one metal layer having thickness greater than about 1 micron; wherein an average surface roughness of the smooth electrode is less than about 10 nm.
1. A method of fabricating an electrode, comprising:
providing a wafer, wherein the wafer comprises bonding a thermally blocking layer including one or more vias through the thermal blocking layer;
providing a substrate;
depositing a plurality of layers having electrically and thermally conductive materials such as metal on a top surface of the substrate; then
bonding the wafer to the metal coated substrate; then
electroplating one or more vias in the wafer using a metal to form an electrical feedthroughs through a thermal blocking layer; and then;
removing the substrate to form a smooth electrode.
2. The method of claim 1 , wherein a surface roughness of the smooth electrode is substantially equal to the surface roughness of the substrate.
3. The method of claim 2 , wherein a thickness of metal coated substrate is greater than about 1 micron and wherein an average surface roughness of the smooth electrode is less than about 10 nm.
4. A method of fabricating an electrode, comprising:
providing a sacrificial substrate;
patterning a top surface of the sacrificial substrate to include nanoscale features; then
depositing a metal layer on the top surface of the sacrificial substrate including the nanoscale features;
planarizing a top surface of the metal layer; then bonding a wafer to the metal layer, wherein the wafer comprises a thermally blocking layer; and then;
removing the sacrificial substrate to form a textured electrode by etching.
5. The method of claim 4 , wherein the thermally blocking layer comprises one or more vias through the thermal blocking layer.
6. The method of claim 4 , further comprising electroplating the one or more vias with a metal to form the electrical feedthroughs through the thermal blocking layer.