Mold structure, patterning method using the same, and method of fabricating liquid crystal display device
View Patent ↗A mold structure, a patterning method thereof and a method of fabricating an LCD device using the same are disclosed, which can realize a conformal contact by applying a voltage between a mold structure and a material layer being opposite to each other in an In-Plane Printing process, so as to prevent defective patterns, wherein the mold structure comprises a mold whose surface is provided with patterns; a backplane for supporting the mold; and a conductive film formed between the backplane and the mold.
1. A mold structure comprising:
a mold having patterns configured to form a column spacer, a white color filter, an overcoat layer and one or more via holes through a pattern material on a substrate to form one or more contact holes with one or more electrodes on the substrate, the patterns including at least one recess having a shape corresponding to a shape of the column spacer and at least one protrusion having a shape corresponding to a shape of the one or more contact holes, wherein the column spacer and the one or more contact hoes are embossed on the pattern material;
a backplane formed on a rear surface of the mold, wherein the backplane is larger than the mold in size so as to allow the mold to mount thereon;
a conductive film formed on a surface of the backplane and adhered to the rear surface of the mold;
wherein the substrate coated with the pattern material layer is disposed in opposite to the mold to be patterned by the mold and wherein the size of the substrate is same to that of the mold;
wherein the rear surface of the substrate having no voltage applying pad is grounded and the constant voltage is applied only to the conductive film of the mold structure and to a stage;
wherein the conductive film is comprised of PEDOT (Poly 3,4-ethylenedioxythophene) or polyaniline; and
wherein the pattern material layer has a dielectric constant(e r ) between 3.5˜7 and the mold has a thickness of 10˜50 μm to maintain a distance(d) between the rear surface of the mold and the rear surface of the substrate, in consideration of the relation: P∝V(e r ) 2 /d, wherein P is a pressure between the mold and the pattern material layer, V is the constant voltage applied between the conductive film and the rear surface of the substrate.
2. The mold structure of claim 1 , wherein the mold has a modulus of about 10 MPa or more.
3. The mold structure of claim 2 , wherein the mold is formed of polyurethane.