Method of manufacturing SAW device substrates
View Patent ↗A method of manufacturing composite structures, or composite substrates, for a Surface Acoustic Wave (SAW) device are provided. In one embodiment of the present disclosure, a piezoelectric substrate is provided. A supporting substrate is formed over a first surface of the piezoelectric substrate. The first surface of the piezoelectric substrate may be unpolished. A second surface of the piezoelectric substrate is then processed to a desired thickness and polished. SAW device components such as, for example, interdigitated transducers (IDTs) and reflectors are then formed on the polished surface of the piezoelectric substrate. The supporting substrate may be formed using any desired type of deposition or growth process.
1. A method comprising:
providing a piezoelectric substrate having a first unpolished surface and a second unpolished surface;
forming a supporting substrate over the first unpolished surface of the piezoelectric substrate to provide a composite structure, such that the forming the supporting substrate includes at least one of a deposition or a growth process on the first unpolished surface of the piezoelectric substrate;
polishing the second unpolished surface of the piezoelectric substrate to form a polished second surface after formation of the supporting substrate over the first unpolished surface; and
forming at least one Surface Acoustic Wave (SAW) device component on the polished second surface of the piezoelectric substrate after polishing the second unpolished surface of the piezoelectric substrate.
2. The method of claim 1 wherein forming the supporting substrate comprises forming the supporting substrate over the first unpolished surface of the piezoelectric substrate at room temperature.
3. The method of claim 1 wherein the piezoelectric substrate is formed from a deposited piezoelectric thin film material.
4. The method of claim 1 wherein the piezoelectric substrate has a thermal coefficient of expansion (TCE) in a range of and including 10 to 20 parts per million (ppm)/degree Celsius.
5. The method of claim 1 wherein the supporting substrate is formed from at least one of a group consisting of: silicon, silicon dioxide, fused silica, sapphire, ceramic alumina, ceramic glass, low thermal coefficient of expansion (TCE) glass, diamond, invar, elinvar, kovar, titanium niobium invar, chromium, platinum, palladium based invar, tungsten, carbide foil, chromium foil, titanium dioxide doped silica, powder filled composition, and sol-gel based solidifying composition.
6. The method of claim 1 wherein the supporting substrate has an isolated thermal coefficient of expansion (TCE) in a range of and including −10 to 10 parts per million (ppm)/degree Celsius.
7. The method of claim 1 wherein the supporting substrate has a Young's Modulus in a range of and including 20 to 1200 Giga Pascals (GPa).
8. The method of claim 1 wherein the supporting substrate has an isolated thermal coefficient of expansion (TCE) that is significantly less than an isolated TCE of the piezoelectric substrate.
9. The method of claim 1 wherein forming the supporting substrate comprises forming the supporting substrate over the first unpolished surface of the piezoelectric substrate using a process selected from a group consisting of: vacuum evaporation, sputtering, chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), chemical growth from solutions or melts, electroplating from solutions or melts, cementation of powders with organic and inorganic ingredients, sol-gel route, and spraying.
10. The method of claim 1 wherein the piezoelectric substrate is formed from a piezoceramic material.