Patterning method for light-emitting devices
View Patent ↗A method of patterning a substrate that includes locating a single mask film over the substrate and forming first opening portions in first locations in the mask film. First electrical materials are deposited over the substrate and mask film to form patterned areas in the first locations. Second opening portions are formed in second locations different from the first locations in the mask film. Subsequently, second electrical materials are deposited over the substrate and mask film to form patterned areas in the first and second locations.
1. A method comprising in the following order the steps of:
locating patterned electrodes on a substrate and an insulating element between the electrodes;
locating a single pre-made mask film over the substrate;
forming first opening portions in first locations in the single pre-made mask film;
depositing first electrical materials over the substrate and the single pre-made mask film to form patterned areas in the first locations;
forming second opening portions in second locations different from the first locations in the single pre-made mask film;
depositing second electrical materials over the substrate and the single pre-made mask film to form patterned areas in the first and second locations; and
removing the single pre-made mask film after the second electrical materials are deposited, wherein the entire single pre-made mask film is removed.
2. A method comprising in the following order the steps of:
locating patterned electrodes on a substrate and an insulating element between the electrodes;
locating a single pre-made mask film over the substrate;
forming first opening portions in first locations in the single pre-made mask film;
depositing first electrical materials over the substrate and the single pre-made mask film to form patterned areas in the first locations;
forming second opening portions in second locations different from the first locations in the single pre-made mask film;
depositing second electrical materials over the substrate and the single pre-made mask film to form patterned areas in the first and second locations;
forming third opening portions in third locations different from the first and second locations in the single pre-made mask film;
depositing third electrical materials over the substrate and the single pre-made mask film to form patterned areas in the first, second, and third locations; and
removing the single pre-made mask film after the third electrical materials are deposited, wherein the entire single pre-made mask film is removed.
3. The method of claim 1 , wherein the electrical materials are one or more of the following: light-emitting materials, non-transparent conductive materials, transparent conductive materials, charge-control materials, and semi-conductive materials.
4. The method of claim 1 , wherein the electrical materials include one or more of the following: organic, metal oxide, silicon, doped silicon, zinc oxide, doped zinc oxide, quantum dots, metal, or metal alloy materials.
5. The method of claim 1 , wherein the electrical materials are deposited by evaporation, sputtering, spray, curtain, or inkjet deposition.
6. The method of claim 1 , wherein at least some of the electrical materials are light-emitting materials and at least some of the formed patterned areas emit light.
7. The method of claim 4 , wherein the electrical materials comprise a plurality of different electrical materials deposited in different layers.
8. The method of claim 7 , wherein either a metal layer, metal alloy layer, or metal oxide layer is the last layer formed before the second opening portion is formed.
9. The method of claim 7 , wherein one of the patterned areas has deposited thereon first and second layers and another patterned area has only the second layer.
10. The method of claim 7 , wherein the electrical materials deposited in one patterned area are a subset of the electrical materials deposited in a different patterned area.
11. The method of claim 1 , wherein one patterned area is a light-emitting area and another patterned area is a conductive bus area.
12. The method of claim 1 , wherein the first opening portions are formed by segmented material in the first locations or wherein the first opening portions are formed by segmenting the single pre-made mask film around the periphery of the first locations and mechanically removing the single pre-made mask film within the periphery.
13. The method of claim 1 , wherein the single pre-made mask film is segmented around the periphery of the first and second locations before the first materials are deposited.