Gradient colored mask
View Patent ↗The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
1. A process for forming a structure comprising:
a) providing a transparent support;
b) forming a color mask, wherein the color mask has an associated absorption spectral range and wherein, within the absorption spectral range, the color mask has at least an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range;
c) coating a layer of a photopatternable material, sensitive to visible light in the absorption spectral range, on the transparent support after forming the color mask;
d) exposing the layer of photopatternable material through the color mask with visible light to form a photopatternable material in a second exposed state that is different from a first as-coated state;
e) developing the exposed photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion;
f) depositing a layer of functional material before or after coating the photopatternable material; and
g) patterning the layer of functional material using the photopattern such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
2. The process of claim 1 wherein the photopattern corresponds to one of said at least two portions.
3. The process of claim 1 wherein the photopattern corresponds to both of said at least two portions.
4. The process of claim 3 wherein the photopattern has either different thickness or different etch resistance corresponding to said at least two portions of the partially absorptive portion.
5. The process of claim 2 further comprising the following steps:
h) coating a second layer of photopatternable material, sensitive to visible light in the absorption spectral range, on the transparent support;
i) exposing the second layer of photopatternable material through the color mask with visible light to form a photopatternable material in a second exposed state that is different from an first as-coated state;
j) developing the exposed photopatternable material of step (i) to form a photopattern corresponding to both of the said two portions of the partially absorptive portion;
k) depositing a second layer of functional material before or after coating the second layer of photopatternable material; and
l) patterning the second layer of functional material using the photopattern such that a second pattern of functional material results corresponding to both of the said two at least two portions of the partially absorptive portion.
6. The process of claim 1 wherein the color mask is a multicolor mask further comprising a second color mask with a second associated absorption spectral range.
7. The process of claim 6 wherein, within the second absorption spectral range, the second color mask has at least an effectively transparent portion and a partially absorptive portion, and wherein the partially absorptive portion includes at least two portions having different optical densities within the second absorption spectral range.
8. The process of claim 1 wherein the color mask is formed on the transparent support.
9. The process of claim 8 wherein the layer of functional material is deposited on the same side of the transparent support as the color mask.
10. The process of claim 1 wherein the visible light utilized for exposing the layer of photopatternable material has a spectrum corresponding to the absorption spectral range.
11. The process of claim 1 wherein the visible light is white light, and the photopatternable material is only sensitive to light having a spectrum corresponding to the absorption spectral range.
12. The process of claim 1 wherein said transparent support comprises glass or flexible polymer.
13. The process of claim 1 wherein the photopatternable material is sensitive to a single color.
14. The process of claim 1 wherein the layer of photopatternable material contains an initiator system, for ethylenic addition polymerization, containing as a photoinitiator a dye capable of absorbing imaging radiation to achieve an excited state only within a specific color wavelength range.
15. The process of claim 1 wherein said photopatternable material contains at least one addition polymerizable ethylenically unsaturated compound selected from the group consisting of monomers, oligomers, or crosslinkable polymers, and mixtures thereof, and having a boiling point above 100 degrees C. at atmospheric pressure.
16. The process of claim 1 wherein said functional material comprises dielectric, conductive, or semiconductive material.
17. An article comprising:
a) a transparent support;
b) a color mask attached to the transparent support; wherein the color mask has an associated absorption spectral range and wherein, within the absorption spectral range, the color mask has at least an effectively transparent portion and a partially absorptive portion, the partially absorptive portion including at least two portions having different optical densities within the absorption spectral range; and
c) at least one patterned functional layer on the same side of the transparent support as the color mask and in register with at least one portion of said at least two portions.
18. The article of claim 17 wherein at least one patterned layer of functional material is conductive, dielectric, or semiconductive.
19. The article of claim 17 wherein said article comprises in order, on the same side of the transparent support as said at least one colored pattern, a patterned conductive layer and a patterned dielectric layer.
20. A process for forming a structure comprising:
a) providing a transparent support;
b) forming a color mask, wherein the color mask has an associated absorption spectral range and wherein, within the absorption spectral range, the color mask has at least an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range;
c) coating a layer of a functional photopatternable material, sensitive to visible light in the absorption spectral range, on the transparent support after forming the color mask;
d) exposing the layer of functional photopatternable material through the color mask with visible light to form a photopatternable material in a second exposed state that is different from a first as-coated state; and
e) developing the exposed layer of functional photopatternable material to provide patterned functional photopatternable material corresponding to at least one of said at least two portions of the partially absorptive portion.