Optoelectronic semiconductor chip and method for producing it
View Patent ↗An optoelectronic semiconductor chip ( 12 ) is disclosed comprising a thin-film semiconductor body ( 8 ), which comprises a semiconductor layer sequence ( 2, 20 ) having an active region ( 3 ) suitable for generating radiation, and comprising a carrier layer ( 7 ), which is formed on the semiconductor layer sequence and carries the thin-film semiconductor body.
1. A method for producing an optoelectronic semiconductor chip comprising the steps of:
providing a semiconductor layer sequence arranged on a substrate for a semiconductor body of the semiconductor chip, wherein the semiconductor layer sequence has an active region suitable for generating radiation;
forming a carrier layer on the semiconductor layer sequence; and
removing the substrate,
wherein the carrier layer is electrically insulating, and
wherein the carrier layer is deposited on the semiconductor layer sequence by means of a deposition method.
2. The method as claimed in claim 1 ,
wherein
the carrier layer is formed on that side of the semiconductor layer sequence which is remote from the substrate.
3. The method as claimed in claim 1 ,
wherein
the carrier layer is formed on the semiconductor layer sequence by means of a thin-film method.
4. The method as claimed in claim 1 ,
wherein
the carrier layer is deposited on the semiconductor layer sequence by means of a PVD method or a CVD method.
5. The method as claimed in claim 1 ,
wherein the carrier layer is deposited on the semiconductor layer sequence by means of a sputtering, by means of a laser-assisted method, or by means of a vapor deposition.
6. The method as claimed in claim 1 ,
wherein
a metal-containing layer, in particular a metal- or alloy-based layer, is applied to that side of the semiconductor layer sequence which is remote from the substrate, prior to forming the carrier layer.
7. The method as claimed in claim 1 ,
wherein
the substrate comprises a growth substrate on which the semiconductor layer sequence is grown epitaxially.
8. The method as claimed in claim 1 ,
wherein
the method is carried out for simultaneously producing a plurality of semiconductor chips in the wafer assembly.
9. The method as claimed in claim 8 ,
wherein
a side face that delimits the carrier layer of a semiconductor chip produced by means of the method is formed during a singulation of the semiconductor chip from the wafer assembly.
10. The method as claimed in claim 1 , wherein the carrier layer is deposited on the semiconductor layer sequence by means of a reactive sputtering or by means of a deposition method using a pulsed laser.
11. A method for producing an optoelectronic semiconductor chip comprising the steps of:
providing a semiconductor layer sequence arranged on a substrate for a semiconductor body of the semiconductor chip, wherein the semiconductor layer sequence has an active region suitable for generating radiation;
forming a carrier layer on the semiconductor layer sequence; and
removing the substrate,
wherein the carrier layer is electrically insulating, and
wherein the carrier layer is formed on the semiconductor layer sequence with a thickness that grows progressively during the forming of the carrier layer.