Liquid crystal display device and method for fabricating the same
View Patent ↗A liquid crystal display (LCD) device and a method for fabricating the same is disclosed, to obtain high aperture ratio and to solve the problem due to the force of gravity, which includes first and second substrates facing each other at a predetermined distance; gate and data lines crossing each other on the first substrate, to define a pixel region; a first common line substantially parallel to the gate line; a thin film transistor where the gate and data lines cross; a first insulating interlayer on an entire surface of the first substrate including the thin film transistor; an insulating layer having walls above the gate and data lines; a second common line and a common electrode in the pixel region extending in one direction, and overlapping with the gate line, the data line and the thin film transistor; and a pixel electrode in contact with a drain electrode of the thin film transistor and between the common electrodes of the pixel region at fixed intervals.
1. A liquid crystal display (LCD) device comprising:
first and second substrates facing each other at a predetermined distance;
gate and data lines crossing each other on the first substrate, to define a pixel region;
a first common line substantially parallel to the gate line;
a thin film transistor where the gate and data lines cross;
a first insulating interlayer on an entire surface of the first substrate including the thin film transistor;
a second insulating interlayer on the entire surface of the first insulating interlayer;
walls on the second insulating interlayer above the gate line and the adjacent data line, to surround the lower side of the pixel region;
a second common line and a common electrode in the pixel region extending in one direction and overlapping the gate line, the data line, and the thin film transistor; and
a pixel electrode in contact with a drain electrode of the thin film transistor and between the common electrodes at fixed intervals.
2. The LCD device of claim 1 , wherein the insulating layer and the walls are formed of an organic insulating layer having a low dielectric constant, including one of photo acryl, polyimide, and BCB (BenzoCycloButene).
3. A liquid crystal display (LCD) device comprising:
first and second substrates facing each other at a predetermined distance;
gate and data lines crossing each other on the first substrate, to define a pixel region;
a thin film transistor where the gate and data lines cross;
a first insulating interlayer on an entire surface of the first substrate including the thin film transistor;
a second insulating interlayer on the entire surface of the first insulating interlayer;
walls above the gate line and the adjacent data line, to surround the lower side of the pixel region; and
a pixel electrode being contact with a drain electrode of the thin film transistor within the pixel region.
4. The LCD device of claim 3 , wherein the second insulating interlayer and the walls are formed of an organic insulating layer having a low dielectric constant, including one of photo acryl, polyimide, and BCB (BenzoCycloButene).
5. A method for fabricating a liquid crystal display (LCD) device comprising:
forming a gate line having a gate electrode at one side of a substrate;
forming a first common line substantially parallel to the gate line;
forming a gate insulating layer on an entire surface of the substrate including the gate line;
forming an active layer above the gate electrode;
forming a data line substantially perpendicular to the gate line, to define a pixel region;
forming source and drain electrodes overlapping both sides of the active layer;
forming a first insulating interlayer on the entire surface of the substrate including the data line;
forming a second insulating interlayer on the entire surface of the first insulating interlayer;
forming walls above the gate line and the adjacent data line to surround the lower side of the pixel region;
forming a second common line and a common electrode in the pixel region extending in one direction and overlapping the gate line, the data line, and the thin film transistor; and
forming a pixel electrode in contact with a drain electrode of the thin film transistor and between the common electrodes at fixed intervals.
6. The method of claim 5 , wherein the second insulating interlayer is formed on the entire surface of the first insulating interlayer including the data line by a first printing method, and the walls are formed on the second insulating interlayer by a second printing method, each wall having a height corresponding to a cell gap.
7. The method of claim 5 , wherein the second insulating interlayer and the walls are formed of an organic insulating layer having a low dielectric constant, including one of photo acryl, polyimide, and BCB (BenzoCycloButene).
8. A method of fabricating a liquid crystal display (LCD) device comprising:
forming a gate line having a gate electrode at one side of a substrate;
forming a gate insulating layer on an entire surface of the substrate including the gate line;
forming an active layer above the gate electrode;
forming a data line substantially perpendicular to the gate line, to define a pixel region;
forming source and drain electrodes overlapping both sides of the active layer;
forming a first insulating interlayer on the entire surface of the substrate including the data line;
forming a second insulating interlayer on the entire surface of the first insulating interlayer;
forming walls above the gate line and the adjacent data line, to surround the lower side of the pixel region; and
forming a pixel electrode in contact with a drain electrode of the thin film transistor within the pixel region.
9. The method of claim 8 , wherein the second insulating interlayer and the walls are formed of an organic insulating layer having a low dielectric constant, including one of photo acryl, polyimide, and BCB (BenzoCycloButene).