Pattern transcription device and method of fabricating cliche for the same
View Patent ↗A pattern transcription apparatus comprises a cliché including a concave portion, a convex portion and a printing stopper, the printing stopper formed in the concave portion; and a blanket, on which a resist material layer is coated, rotatable on the cliché, wherein edges of the printing stopper protruding from the printing stopper to have a height greater than a top surface of the convex portion.
1. A method of fabricating a cliché for a pattern transcription apparatus, comprising:
forming a metal pattern on a substrate;
etching the substrate using the metal pattern as an etching mask to form a concave portion and a convex portion;
depositing a low surface energy density material layer to cover the entire surface of the substrate including the concave portion and the convex portion;
using the low surface energy density material layer inside the concave portion to form a printing stopper, wherein the printing stopper is formed with a center top surface and two protruding edges protruding from edges of the center top surface, and wherein the two protruding edges have a same height as the convex portion, the center top surface has a lower height than the convex portion; and
partially etching the substrate in the convex portion using the printing stopper as a second etching mask such that the center flat top surface has a same height as the convex portion and the two protruding edges have a greater height than the convex portion.
2. The method according to claim 1 , wherein the step of forming the printing stopper comprise:
forming the surface energy density material layer on both a bottom surface and a sidewall of the concave portion, wherein the low surface energy density material layer in the sidewall has a height higher than a central top surface of the low surface energy material; and
removing the metal pattern and the low surface energy density material layer on the metal pattern to form the printing stopper and expose the substrate in the convex portion.
3. The method according to claim 2 ; wherein the low surface energy density material layer includes Teflon™.
4. The method according to claim 1 , wherein the step of forming the metal pattern comprises:
forming a metal layer on the substrate;
forming a photosensitive material pattern on the metal layer; and
etching the metal layer using the photosensitive material pattern as a third etching mask to form the metal pattern.
5. The method according to claim 4 , the metal layer includes at least one of molybdenum (Mo), chromium (Cr) and nickel (Ni).