Method of fabricating color filter substrate and infrared heating apparatus for the same

1. A method of fabricating a color filter substrate, comprising:

coating a first color resist layer on an entire surface of a substrate;

exposing the substrate;

developing the exposed first color resist layer to form a first color filter pattern;

coating a second color resist layer over the entire surface of the substrate;

exposing the substrate;

developing the exposed second color resist layer to form a second color filter pattern;

partially curing the second color filter pattern by irradiating the substrate with infrared rays during an intermediate heating time;

coating a third color resist layer over the entire surface of the substrate;

exposing the substrate;

developing the exposed third color resist layer to form a third color filter pattern; and

simultaneously curing the first to the third color filter patterns by irradiating the substrate with infrared rays during a final heating time,

wherein the intermediate heating time is decided within a range in which a shape of the first and second color filter patterns can be maintained in a subsequent development process, and

wherein a coating sequence is selected according to a difference in a development characteristic of each of the first to third color resist layers such that a material for the first color resist layer is selected to maintain a pattern characteristic without a curing process, a material for the second color resist layer is selected to maintain a pattern characteristic with a partial infrared curing process, and a material for the third color resist layer is selected to have a pattern characteristic with complete infrared curing process.

2. The method of claim 1 , wherein the intermediate heating time is shorter than the final heating time.

3. The method of claim 1 , wherein the intermediate heating time ranges from 3 minutes to 7 minutes.

4. The method of claim 1 , wherein the final heating time is decided to have a value in which the third color filter pattern is fully cured.

5. The method of claim 1 , wherein each of the first and second color resist layers maintains a shape of a pattern during a development process compared with the third color resist layer that is coated subsequently.

6. The method of claim 1 , wherein each of the first to third color resist layers includes one of color resists of red (R), green (G), and blue (B).

7. The method of claim 1 , further comprising:

before coating the first color resist layer on the entire surface of the substrate,

cleaning the substrate; and

removing moisture of the cleaned substrate using a pre-baking process.

8. The method of claim 1 , further comprising:

forming black matrices on the substrate before the first color resist layer is coated; and

forming an over-coating film over the substrate on which the third color filter pattern is formed.

9. The method of claim 8 , further comprising forming a transparent electrode layer on the over-coating film.