IP Library Granted Patent US 7,851,263
Granted Patent B2
US 7,851,263 · App. 12/005,384 · Granted Dec 14, 2010

Semiconductor device and method of manufacturing the same

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Quick Facts
Patent No.
US 7,851,263
App. No.
12/005,384
Granted
Dec 14, 2010
Kind
B2
Abstract

A method of manufacturing a semiconductor device including (1) providing a metal plate having an upper surface and a back surface, the metal plate including a plurality of lids disposed in matrix, which are defined by a first groove formed from the upper surface, (2) providing a ceramic sheet having an upper surface and a back surface, the ceramic sheet including a plurality of headers disposed in matrix, which are defined by a second groove formed from the back surface, (3) fixing the metal plate on the ceramic sheet by facing the back surface of the metal plate to the upper surface of the ceramic sheet, wherein the first groove is aligned with the second groove, and (4) dividing the metal plate and the ceramic sheet along the first and the second grooves.

Claims (24)

1. A method of manufacturing a semiconductor device, comprising:

providing a metal plate having an upper surface and a back surface, the metal plate including a plurality of lids disposed in matrix, which are defined by a first groove formed from the upper surface;

providing a ceramic sheet having an upper surface and a back surface, the ceramic sheet including a plurality of headers disposed in matrix, which are defined by a second groove formed from the back surface;

fixing the metal plate on the ceramic sheet by facing the back surface of the metal plate to the upper surface of the ceramic sheet, wherein the first groove is aligned with the second groove; and

dividing the metal plate and the ceramic sheet along the first and the second grooves,

wherein, before fixing the metal plate on the ceramic sheet, the metal plate has a first thickness in a portion at which the first groove is formed and a second thickness in a remaining portion, the second thickness is a sum of the first thickness and a depth of the first groove,

wherein the first grooves are V-shaped, and the inner walls of the first groove is inclined with an angle θ from the vertical direction,

wherein the metal plate is fixed on the ceramic sheet by a roller electrode, which includes at its tip a conical member whose peripheral edge is inclined with an angle θ from the vertical direction, which is the substantially the same angle of the first groove, and

whereby the conical member fits in the first groove, and the metal plate is fixed on the ceramic sheet by rolling the conical member in the first groove while electric power is applied to the roller electrode.

2. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the first groove is formed by dicing from the upper surface with a dicing blade.

3. A method of manufacturing a semiconductor device as claimed in claim 2 , wherein a depth of the first groove is set in the range of 50 and 80 percents of the thickness of the metal plate.

4. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the first groove is formed together with a forming of the metal plate.

5. A method of manufacturing a semiconductor device as claimed in claim 4 , wherein a depth of the first groove is set in the range of 50 and 80 percents of the thickness of the metal plate.

6. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the second groove is formed by dicing from the back surface with a dicing blade.

7. A method of manufacturing a semiconductor device as claimed in claim 6 , wherein a depth of the second groove is set in the range of 50 and 80 percents of the thickness of the ceramic sheet.

8. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the second groove is formed together with a forming of the ceramic sheet.

9. A method of manufacturing a semiconductor device as claimed in claim 8 , wherein a depth of the second groove is set in the range of 50 and 80 percents of the thickness of the ceramic sheet.

10. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the metal plate and the ceramic sheet is divided by applying external force to the metal plate and the ceramic sheet.

11. A method of manufacturing a semiconductor device as claimed in claim 1 ,

wherein the conical member is a first conical member,

wherein the metal plate is fixed on the ceramic sheet by the roller electrode, which includes a second conical member, which is the substantially the same shape and a size as the first conical member, whose bottom surface is fixed on a bottom surface of the first conical member.

12. A method of manufacturing a semiconductor device as claimed in claim 1 , further comprising, providing a sealing sheet between the metal plate and the ceramic sheet before fixing them.

13. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein the back surface of the metal plate is flat.

14. A method of manufacturing a semiconductor device as claimed in claim 1 , wherein, when the metal plate is fixed on the ceramic sheet, the entire back surface of the metal plate is disposed at substantially the same level from the back surface of the ceramic sheet.

Assignments (3)
CHANGE OF NAME Recorded Mar 21, 2014
From: OKI SEMICONDUCTOR CO., LTD
To: LAPIS SEMICONDUCTOR CO., LTD.
Reel/Frame 032495/0483 →
CHANGE OF NAME Recorded Jan 22, 2009
From: OKI ELECTRIC INDUSTRY CO., LTD.
To: OKI SEMICONDUCTOR CO., LTD.
Reel/Frame 022162/0669 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2007
From: FUCHINOUE, KENJI
To: OKI ELECTRIC INDUSTRY CO., LTD.
Reel/Frame 020340/0211 →