Perpendicular pole with bilayer gap
View Patent ↗A perpendicular write pole having dual gap layers is disclosed. An outer gap layer, resistant to etching and corrosion in alkaline solutions protects the inner gap layer during photo resist development. An inner gap layer, resistant to acid etch conditions, protects the magnetic pole materials during removal of portions of the outer gap layer prior to electroplating of the pole to form the flare point.
1. A method for fabricating a thin film perpendicular write head comprising:
fabricating a magnetic pole layer, said magnetic pole layer having a first portion and a second portion;
depositing a first non-magnetic gap layer on said first and said second portions of said magnetic pole layer, said first non-magnetic gap layer being resistant to etching in solutions having a pH less than 7;
depositing a second non-magnetic gap layer on said first non-magnetic gap layer deposited on said first and said second portions of said magnetic pole layer, said second non-magnetic gap layer being resistant to etching in solutions having a pH greater than 7;
covering said second non-magnetic gap layer deposited on said first portion of said pole layer with a photo resist layer;
removing said second non-magnetic gap layer deposited on said second portion of said magnetic pole with a solution having a pH of less than 7, without damaging said photo resist layer; and,
removing said first non-magnetic gap layer deposited on said second portion of said magnetic pole layer with a solution having a pH greater than 7, without damaging said second portion of said magnetic pole.
2. The method as recited in claim 1 , further comprising depositing magnetic material on said second portion of said magnetic pole layer, subsequent to removing said first non-magnetic gap layer, creating a flare point on said magnetic pole layer at the boundary between said first portion and said second portion of said magnetic pole layer.
3. The method as recited in claim 1 , wherein said first non-magnetic gap layer is alumina.
4. The method as recited in claim 1 , wherein said second non-magnetic gap layer comprises Ti.
5. The method as recited in claim 4 , wherein said second non-magnetic gap layer comprises oxides of Ti.
6. The method as recited in claim 1 , wherein said second non-magnetic gap layer comprises Cr.
7. The method as recited in claim 1 , wherein said second non-magnetic gap layer comprises Al.
8. The method as recited in claim 1 , wherein said second non-magnetic gap layer comprises oxides of tantalum.
9. A method for fabricating a thin film perpendicular write head comprising:
fabricating a magnetic pole layer, said magnetic pole layer having a first portion and a second portion;
depositing a first non-magnetic gap layer on said first and said second portions of said magnetic pole layer, said first non-magnetic gap layer comprising alumina;
depositing a second non-magnetic gap layer on said first non-magnetic gap layer deposited on said first and said second portions of said magnetic pole layer, said second non-magnetic gap layer being resistant to etching in solutions having a pH greater than 7;
covering said second non-magnetic gap layer deposited on said first portion of said pole layer with a photo resist layer;
removing said second non-magnetic gap layer deposited on said second portion of said magnetic pole with a solution having a pH of less than 7, without damaging said photo resist layer; and,
removing said first non-magnetic gap layer deposited on said second portion of said magnetic pole layer with a solution having a pH greater than 7, without damaging said second portion of said magnetic pole.
10. The method as recited in claim 9 , further comprising depositing magnetic material on said second portion of said magnetic pole layer, subsequent to removing said first non-magnetic gap layer, creating a flare point on said magnetic pole layer at the boundary between said first portion and said second portion of said magnetic pole layer.
11. The method as recited in claim 10 , wherein said magnetic material is deposited by electroplating.
12. The method as recited in claim 10 , wherein a width of said second portion of said magnetic pole layer is increased by a factor between 2 and 3 times subsequent to depositing said magnetic material.
13. The method as recited in claim 9 , wherein said second non-magnetic gap layer comprises Ti.
14. The method as recited in claim 13 , wherein said second non-magnetic gap layer comprises oxides of Ti.
15. The method as recited in claim 9 , wherein said second non-magnetic gap layer comprises Cr.
16. The method as recited in claim 9 , wherein said second non-magnetic gap layer comprises Al.
17. The method as recited in claim 9 , wherein said second non-magnetic gap layer comprises oxides of tantalum.
18. A method for fabricating a thin film perpendicular write head comprising:
fabricating a magnetic pole layer, said magnetic pole layer having a first portion and a second portion;
depositing a first non-magnetic gap layer on said first and said second portions of said magnetic pole layer, said first non-magnetic gap layer comprising alumina;
depositing a second non-magnetic gap layer on said first non-magnetic gap layer deposited on said first and said second portions of said magnetic pole layer, wherein said second non-magnetic gap layer is chosen from the group consisting of Cr, Al, Ti, oxides of Ti, and oxides of tantalum;
removing said second non-magnetic gap layer deposited on said second portion of said magnetic pole with a solution having a pH of less than 7; and,
removing said first non-magnetic gap layer deposited on said second portion of said magnetic pole layer with a solution having a pH greater than 7.
19. The method as recited in claim 18 , further comprising depositing magnetic material on said second portion of said magnetic pole layer, subsequent to removing said first non-magnetic gap layer, creating a flare point on said magnetic pole layer at the boundary between said first portion and said second portion of said magnetic pole layer.
20. The method as recited in claim 19 , wherein a width of said second portion of said magnetic pole layer is increased by a factor between 2 and 3 times subsequent to depositing said magnetic material.