Method, a processor, and a system for tracking a focus of a beam
View Patent ↗A system, a processor, and a method for tracking a focus of a beam are described. The method includes determining a plurality of intensities corresponding to a plurality of voltages, and applying a first voltage of the plurality of voltages corresponding to a maximum intensity of the plurality of intensities during a scan.
1. A method for tracking a focus of a beam, said method comprising:
determining a plurality of intensities corresponding to a plurality of voltages; and
applying a first voltage of the plurality of voltages corresponding to a maximum intensity of the plurality of intensities during a scan.
2. A method in accordance with claim 1 , wherein said determining a plurality of intensities comprises determining a plurality of intensities by scanning a space between two objects.
3. A method in accordance with claim 1 , wherein said applying a first voltage of the plurality of voltages comprises applying the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
4. A method in accordance with claim 1 , further comprising changing a voltage of an electron beam by applying the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
5. A method in accordance with claim 1 , further comprising changing a voltage of an electron beam that heats an anode by applying the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
6. A method in accordance with claim 1 , further comprising storing the first voltage without storing remaining voltages of the plurality of voltages.
7. A method in accordance with claim 1 , wherein said determining a plurality of intensities comprises determining a plurality of intensities measured at a point in a space by a transmission detector.
8. A system for tracking a focus of a beam, said system comprising:
a memory area; and
a processor configured to:
determine a plurality of intensities corresponding to a plurality of voltages;
store at least one of a plurality of voltages corresponding to the determined plurality of intensities in the memory area; and
send a signal to apply a first stored voltage of the plurality of voltages corresponding to a maximum intensity of the plurality of intensities during a scan.
9. A system in accordance with claim 8 , wherein said processor configured to determine the plurality of intensities by sending a command signal to scan a space between two objects.
10. A system in accordance with claim 8 , wherein said processor configured to send the signal to apply the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
11. A system in accordance with claim 8 , wherein said processor configured to change a voltage of an electron beam by sending the signal representing the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
12. A system in accordance with claim 8 , wherein said processor configured to change a voltage of an electron beam that heats an anode by sending the signal representing the first voltage to a deflection electrode of a radiation source used to generate a diffraction profile.
13. A system in accordance with claim 8 , wherein said processor configured to command to store the first voltage without commanding to store remaining voltages of the plurality of voltages.
14. A system in accordance with claim 8 , wherein said processor configured to determine the plurality of intensities measured at a point in a space by a transmission detector.
15. A system for tracking a focus of a beam, said system comprising:
an X-ray source configured to generate X-rays;
a detector configured to detect the X-rays and generate an electrical output signal representative of the detected X-rays; and
a processor configured to:
determine a plurality of intensities corresponding to a plurality of voltages, one of the plurality of intensities corresponding to the electrical output signal; and
send a signal to apply a first voltage of the plurality of voltages corresponding to a maximum intensity of the plurality of intensities during a scan.
16. A system in accordance with claim 15 , further comprising a first object and a second object, wherein said processor configured to determine the plurality of intensities by sending a command signal to scan defined between the first and second objects.
17. A system in accordance with claim 15 , wherein said X-ray source comprises a deflection electrode, wherein said processor configured to send the signal to apply the first voltage to said deflection electrode.
18. A system in accordance with claim 15 , wherein said X-ray source comprises a deflection electrode and a cathode configured to generate an electron beam, wherein said processor configured to change an anode position of the electron beam by sending the signal representing the first voltage to said deflection electrode.
19. A system in accordance with claim 15 , wherein said X-ray source comprises:
a deflection electrode;
a cathode configured to generate an electron beam; and
an anode configured to receive the electron beam, wherein said processor configured to change a voltage of the electron beam that heats said anode by sending the signal representing the first voltage to said deflection electrode.
20. A system in accordance with claim 15 , wherein said processor configured to command to store the first voltage without commanding to store remaining voltages of the plurality of voltages.