Devices with graphene layers
View Patent ↗A method includes an act of providing a crystalline substrate with a diamond-type lattice and an exposed substantially (111)-surface. The method also includes an act of forming a graphene layer or a graphene-like layer on the exposed substantially (111)-surface.
1. An apparatus, comprising:
a crystalline substrate with a diamond-type lattice and a substantially (111)-surface, the crystalline substrate being a cubic boron nitride substrate;
a graphene-like layer on the substantially (111)-surface; and
a region comprising boron nitride on a portion of the graphene-like layer, the portion of the graphene-like layer being located between the region comprising boron nitride and the substrate.
2. The apparatus of claim 1 , wherein the (111)-surface has lateral lattice constants that match those of lattice constants of the graphene-like layer to, at least, about 3 percent.
3. The apparatus of claim 1 , wherein the graphene-like layer is graphene.
4. The apparatus of claim 1 , further comprising a gate electrode over the region comprising boron nitride.
5. The apparatus of claim 4 wherein a portion of the graphene-like layer is an electrically controllable conduction channel of a transistor, the channel being controllable by the gate electrode.
6. The apparatus of claim 4 , wherein the region is a crystalline layer of boron nitride.
7. The apparatus of claim 1 , wherein the graphene-like layer is 1 to 3 carbon atoms thick.
8. The apparatus of claim 7 , wherein the region is crystalline layer of boron nitride.
9. The apparatus of claim 1 , wherein the graphene-like layer is graphene.
10. The apparatus of claim 1 , further comprising:
source and drain electrodes of a transistor, the electrodes being in contact with a channel portion of the graphene-like layer; and
a gate electrode of the transistor, the region comprising boron nitride being located between the gate electrode and the channel portion of the graphene-like layer, the gate electrode being configured to control the channel portion of the graphene-like layer.
11. The apparatus of claim 10 , wherein the graphene-like layer is 1 to 3 carbon atoms thick.
12. The apparatus of claim 10 , wherein the graphene-like layer is graphene.
13. The apparatus of claim 10 , wherein the region is crystalline layer of boron nitride.
14. The apparatus of claim 1 , wherein the region is a layer of boron nitride.