IP Library Granted Patent US 7,852,072
Granted Patent B2
US 7,852,072 · App. 12/006,323 · Granted Dec 14, 2010

Test-device system for independent characterization of sensor-width and sensor-stripe-height definition processes

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Quick Facts
Patent No.
US 7,852,072
App. No.
12/006,323
Granted
Dec 14, 2010
Kind
B2
Abstract

A test-device system and method for deconvoluting measurements of effects of a sensor-width definition process from measurements of effects of a sensor-stripe-height-definition process in a manufacture of a magnetic sensor. The test-device system comprises a first test device for generating data to characterize a sensor-width-definition process. The test-device system also comprises a second test device for generating data to characterize a sensor-stripe-height-definition process. The test-device system allows independent characterization of a sensor-width parameter and a sensor-stripe-height parameter.

Claims (30)

1. A test-device system for deconvoluting measurements of effects of a sensor-width definition process from measurements of effects of a sensor-stripe-height-definition process in a manufacture of a magnetic sensor, comprising:

a first test device for generating data to characterize a sensor-width-definition process;

a second test device for generating data to characterize a sensor-stripe-height-definition process;

wherein said test-device system allows independent characterization of a sensor-width parameter and a sensor-stripe-height parameter.

2. The test-device-system of claim 1 , wherein said first test device further comprises a sensor-width-definition structure.

3. The test-device-system of claim 2 , wherein said first test device further comprises a first sensor-layer-structure portion with edges, said edges defined in one-cut with said sensor-width-definition process.

4. The test-device-system of claim 2 , wherein said sensor-width-definition structure further comprises a first disk of sensor-layer-structure material.

5. The test-device-system of claim 2 , wherein said sensor-width-definition structure further comprises a first rectangle of sensor-layer-structure material with edges, said first rectangle with a high aspect ratio with the long sides parallel to the sides of the magnetic sensor defined by the sensor-width-definition process.

6. The test-device-system of claim 1 , wherein said second test device further comprises a sensor-stripe-height-definition structure.

7. The test-device-system of claim 6 , wherein said second test device further comprises a second sensor-layer-structure portion with edges, said edges defined in one-cut with said sensor-stripe-height-definition process.

8. The test-device-system of claim 6 , wherein said second sensor-stripe-height-definition structure further comprises a second disk of sensor-layer-structure material.

9. The test-device-system of claim 6 , wherein said sensor-width-definition structure further comprises a second rectangle of sensor-layer-structure material with edges, said second rectangle with a high aspect ratio with the long sides parallel to the sides of the magnetic sensor defined by the sensor-stripe-height-definition process.

10. A test-device system for deconvoluting measurements of effects of a sensor-width definition process from measurements of effects of a sensor-stripe-height-definition process in a manufacture of a magnetic sensor, comprising:

a first test-device-system portion, said first test-device-system portion configured to measure a parameter corresponding to a first sensor-structure-definition process;

wherein said test-device system allows independent characterization of said first sensor-structure-definition-process parameter and a second sensor-structure-definition-process parameter.

11. The test-device system of claim 10 , further comprising a second test-device-system portion, said second test-device-system portion configured to measure a parameter corresponding to a second sensor-structure-definition process.

12. The test-device system of claim 11 , wherein said first sensor-structure-definition process is a sensor-width-definition process and said second sensor-structure-definition process is a sensor-stripe-height-definition process.

13. The test-device system of claim 12 , wherein said first test-device-system portion comprises a first disk of sensor-layer-structure material defined by said sensor-width-definition process, and said second test-device-system portion comprises a second disk of sensor-layer-structure material defined by said sensor-stripe-height-definition process.

14. The test-device system of claim 12 , wherein said first test-device-system portion further comprises a first sensor-layer-structure portion with edges, said edges defined by one-cut with said sensor-width-definition process, and said second test-device-system portion comprises a second sensor-layer-structure portion with edges, said edges defined by one-cut with said sensor-stripe-height-definition process.

15. The test-device system of claim 11 , wherein said first sensor-structure-definition process is a sensor-stripe-height-definition process and said second sensor-structure-definition process is a sensor-width definition process.

16. The test-device system of claim 15 , wherein said second test-device-system portion further comprises a first disk of sensor-layer-structure material defined by said sensor-width-definition process, and said first test-device-system portion further comprises a second disk of sensor-layer-structure material defined by said sensor-stripe-height-definition process.

17. The test-device system of claim 15 , wherein said second test-device-system portion further comprises a first sensor-layer-structure portion with edges, said edges defined by one-cut with said sensor-width-definition process, and said first test-device-system portion comprises a second sensor-layer-structure portion with edges, said edges defined by one-cut with said sensor-stripe-height-definition process.

18. A method for deconvoluting measurements corresponding to effects of a sensor-width definition process from measurements corresponding to effects of a sensor-stripe-height-definition process in a manufacture of a magnetic sensor, comprising:

receiving data from a first test device to characterize a sensor-width-definition process;

receiving data from a second test device to characterize a sensor-stripe-height-definition process;

wherein said method allows independent characterization of a sensor-width parameter and a sensor-stripe-height parameter.

19. The method as recited in claim 18 , further comprising:

determining a parameter characterizing said sensor-width-definition process from said data received from said first test device.

20. The method as recited in claim 18 , further comprising:

determining a parameter characterizing said sensor-stripe-height-definition process from said data received from said second test device.

Assignments (5)
RELEASE OF SECURITY INTEREST AT REEL 052915 FRAME 0566 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 059127/0001 →
SECURITY INTEREST Recorded Feb 6, 2020
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 052915/0566 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 6, 2016
From: HGST NETHERLANDS B.V.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 040826/0821 →
CHANGE OF NAME Recorded Oct 25, 2012
From: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
To: HGST NETHERLANDS B.V.
Reel/Frame 029341/0777 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 28, 2008
From: ARAKI, SATORU; BEACH, ROBERT S.; HONG, YING; SEAGLE, DAVID J.
To: HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V.
Reel/Frame 020425/0857 →