IP Library Granted Patent US 7,871,063
Granted Patent B2
US 7,871,063 · App. 12/012,568 · Granted Jan 18, 2011

Two phase reactor

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Quick Facts
Patent No.
US 7,871,063
App. No.
12/012,568
Granted
Jan 18, 2011
Kind
B2
Abstract

A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.

Claims (49)

1. A gas liquid contactor, comprising:

a reaction chamber;

a liquid inlet coupled to the reaction chamber;

a gas inlet coupled to the reaction chamber;

a liquid outlet coupled to the reaction chamber;

a gas outlet coupled to the reaction chamber; and

an array of nozzles arranged in the reaction chamber and in fluid communication with the liquid inlet and in fluid communication with the gas inlet, wherein the array of nozzles is configured to produce uniformly spaced flat liquid jets shaped to minimize disruption from a gas.

2. The gas liquid contactor of claim 1 , wherein the flat liquid jets are produced at a liquid pressure in the range from about 5 psig to about 25 psig.

3. The gas liquid contactor of claim 1 , wherein the array of nozzles are oriented to provide a cross flow gas liquid contactor.

4. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array is configured to produce a flat liquid jet having a width in the range from about 1 cm to about 5 cm.

5. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array is configured to produce a flat liquid jet having a length about 15 cm or more.

6. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array is configured to produce a flat liquid jet having a thickness in the range from about 5 μm to about 100 μm.

7. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array is configured to produce a flat liquid jet having a width to thickness ratio of greater than about 10.

8. The gas liquid contactor of claim 1 , wherein the array nozzles comprises a single row of nozzles.

9. The gas liquid contactor of claim 1 , wherein the array nozzles comprises at least two rows of nozzles.

10. The gas liquid contactor of claim 8 , wherein a distance between nozzles in the single row is about 1 mm or greater.

11. The gas liquid contactor of claim 1 , wherein the array of nozzles comprises at least two adjacent rows of nozzles separated by a distance greater than about 0.5 cm.

12. The gas liquid contactor of claim 1 , wherein the uniformly spaced flat liquid jets shaped to minimize disruption from the gas, comprise an array of uniformly spaced flat liquid jets and the flat liquid jets are separated by vapor or gas regions.

13. The gas liquid contactor of claim 1 , wherein the array of nozzles are configured to form flat liquid jets having specific area in the range from about 10 cm −1 and 20 cm −1 .

14. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array of nozzles is in fluid communication with a channel region.

15. The gas liquid contactor of claim 1 , wherein at least one of the nozzles in the array of nozzles is in fluid communication with a V-shaped channel region.

16. The gas liquid contactor of claim 1 , wherein the array of nozzles is formed from a single plate.

17. A method of using the apparatus of claim 1 as a gas scrubber, the method comprising the steps of:

forming uniformly spaced flat liquid jets shaped to minimize disruption from a gas; and

scrubbing the gas with the flat liquid jets.

18. The method of claim 17 , wherein the gas comprises at least one of ammonia, carbon dioxide, acid gases, hydrogen sulfide and sulfur dioxide.

19. The method of claim 17 , wherein the gas comprises at least one of chlorine, peroxide, and hypochlorites.

20. A gas liquid contactor, comprising:

a reaction chamber;

a liquid inlet coupled to the reaction chamber;

a gas inlet coupled to the reaction chamber;

a liquid outlet coupled to the reaction chamber;

a gas outlet coupled to the reaction chamber; and

an array of nozzles arranged in the reaction chamber and in fluid communication with the liquid inlet and in fluid communication with the gas inlet, wherein the array of nozzles comprises a nozzle plate comprising a plurality of nozzle rows and each row of nozzles comprises a plurality of nozzles the array of nozzles is configured to produce flat liquid jets in the gas liquid contactor,

wherein each nozzle is formed in at least one of a plurality of channel regions formed in the nozzle plate,

wherein the distance between nozzles in each row is about 2 mm or greater and the distance between at least two adjacent rows of nozzles is greater than about 2 cm, and

wherein the array of nozzles is configured to form flat liquid jets having a specific area per unit volume in the range from about 10 cm −1 to about 20 cm −1 .

21. A gas liquid contactor, comprising:

a reaction chamber;

a liquid inlet coupled to the reaction chamber;

a gas inlet coupled to the reaction chamber;

a liquid outlet coupled to the reaction chamber;

a gas outlet coupled to the reaction chamber; and

an array of nozzles arranged in the reaction chamber and in fluid communication with the liquid inlet and in fluid communication with the gas inlet, wherein the array of nozzles comprises a nozzle plate comprising a plurality of nozzle rows and each row of nozzles comprises a plurality of nozzles, wherein the array of nozzles is configured to produce flat liquid jets shaped to minimize disruption from a gas in the gas liquid contactor, and

wherein each nozzle is formed in at least one of a plurality of channel regions formed in the nozzle plate and each nozzle has an opening greater than about 600 μm.

22. The gas liquid contactor of claim 20 , wherein at least one of the plurality of channel regions has a substantially V-shaped channel region.

23. The gas liquid contactor of claim 20 , wherein the nozzle plate is formed from a single plate.

24. The gas liquid contactor of claim 20 , wherein the plurality of nozzles each have a nozzle opening greater than about 600 μm.

25. The gas liquid contactor of claim 21 , wherein the array of nozzles is configured to form flat liquid jets having specific area in the range from about 10 cm −1 and 20 cm −1 .

Assignments (2)
CHANGE OF NAME Recorded Sep 12, 2008
From: NEUMANN INFORMATION SYSTEMS, INC.
To: NEUMANN SYSTEMS GROUP, INC.
Reel/Frame 021523/0284 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2008
From: MCDERMOTT, WILLIAM EDWARD; NEUMANN, DAVID KURT; HENSHAW, THOMAS LEE
To: NEUMANN INFORMATION SYSTEMS, INC.
Reel/Frame 020516/0035 →