Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays
View Patent ↗The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
1. An array of polymers synthesized by photolithographic synthesis on a surface of a substrate, comprising:
a first layer on a solid support, the first layer including one or more anti-reflective dielectric coatings on the solid support and a second layer including a plurality of different and positionally distinct polymers disposed on the first layer in different features,
wherein the first layer is derivatized and includes a coating of functional groups protected with a photolabile protecting group,
wherein a wavelength of light that is photolytic to the photolabile protecting groups is used to photolyze a first selected region to remove the photolabile protecting groups in the first selected region and to provide exposed functional groups in the first selected region,
wherein the one or more dielectric coatings absorbs the wavelength of light that is exposed to photolabile protecting groups in the first selected region during the photolysis step of the synthesis process to prevent back reflection which may expose light to a region not in the first selected region,
wherein a plurality of monomers are coupled to the exposed functional groups in the first selected region, and
wherein the steps of photolyzing and coupling are repeated in one or more subsequent selected regions overlapping all or part of the first selected region to form positional distinct polymer sequences contained in different features.
2. The array according to claim 1 , wherein the one or more dielectric coatings is a dichroic antireflective coating.
3. The array according to claim 1 , wherein the plurality of polymers comprises a plurality of oligonucleotides.
4. The array according to claim 1 , wherein the one or more dielectric coatings is SiO 2 .
5. The array according to claim 1 , wherein the one or more dielectric coatings comprises hydroxyl, carboxyl, amino, thiol, haloalkyl, 1,2-diol, aldehyde, acryloyl, maleimidyl or N-succinimidylcarboxylate groups used to connect the polymers to the first layer.
6. The array according to claim 1 , wherein the size of the feature on the first layer of the substrate is smaller than about 20 μm.
7. The array according to claim 1 , wherein the size of the feature on the first layer of the substrate is smaller than about 10 μm.
8. The array according to claim 1 , wherein the first layer is derivatized by contacting the first layer with a silanation reagent.
9. The array according to claim 8 , wherein the silanation reagent is selected from the group consisting on Bis-hydroxyethyl-3-aminopropyltriethoxysilane, N(2-hydroxyethyl)-N,N-bis(trimethoxysilylpropyl)amine and Bis(trimethoxysilyl)-ethane.
10. The array according to claim 1 , wherein the photolabile protecting group is MeNPOC.
11. The array according to claim 1 , wherein the plurality of polymers comprises a plurality of polypeptides.
12. An array of polymers synthesized by photolithographic synthesis on a surface of a substrate, comprising:
a first layer on a solid support, the first layer including one or more dichroic antireflective coatings on the solid support and a second layer including a plurality of different and positionally distinct oligonucleotides disposed on the first layer in different features, wherein the first layer is derivatized and includes a coating of functional groups protected with a photolabile protecting group
wherein the one or more dichroic antireflective coatings absorbs a wavelength of light that is exposed to a plurality of photolabile protecting groups in a first selected region during a photolysis step of the synthesis process to prevent back reflection which may expose light to a region not in the first selected region.
13. The array according to claim 12 , wherein the one or more dichroic antireflective coatings is SiO 2 .
14. The array according to claim 12 , wherein the one or more dielectric coatings comprises hydroxyl, carboxyl, amino, thiol, haloalkyl, 1,2-diol, aldehyde, acryloyl, maleimidyl or N-succinimidylcarboxylate groups used to connect the polymers to the first layer.
15. The array according to claim 12 , wherein the size of the feature on the first layer of the substrate is smaller than about 20 μm.
16. The array according to claim 12 , wherein the size of the feature on the first layer of the substrate is smaller than about 10 μm.
17. The array according to claim 12 , wherein the first layer is derivatized by contacting the first layer with a silanation reagent.
18. The array according to claim 17 , wherein the silanation reagent is selected from the group consisting on Bis-hydroxyethyl-3-aminopropyltriethoxysilane, N(2-hydroxyethyl)-N,N-bis(trimethoxysilylpropyl)amine and Bis(trimethoxysilyl)-ethane.
19. An array of polymers synthesized by photolithographic synthesis on a surface of a substrate, comprising:
a first layer on a solid support, the first layer including one or more dichroic antireflective coatings on the solid support and a second layer including a plurality of different and positionally distinct oligonucleotides disposed on the first layer in different features, wherein the size of a feature on the first layer of the substrate is smaller than about 10 μm and wherein the one or more dichroic antireflective coatings absorbs greater than about 75% of photolytic light to a plurality of photolabile protecting groups during a photolysis step of the photolithographic synthesis process.