IP Library Granted Patent US 7,994,495
Granted Patent B2
US 7,994,495 · App. 12/014,884 · Granted Aug 9, 2011

Organic thin film transistors

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Quick Facts
Patent No.
US 7,994,495
App. No.
12/014,884
Granted
Aug 9, 2011
Kind
B2
Abstract

An organic thin film transistor has a gate dielectric layer which is formed from a block copolymer. The block copolymer comprises a polar block and a nonpolar block. The resulting dielectric layer has good adhesion to the gate electrode and good compatibility with the semiconducting layer.

Claims (13)

1. An organic thin film transistor comprising a substrate, a semiconductor layer, and a gate dielectric layer, wherein the gate dielectric layer comprises a block copolymer, wherein the block copolymer comprises a polar block and a nonpolar block, the polar block is bisphenol-A polycarbonate, and the nonpolar block is polydimethylsilane.

2. The transistor of claim 1 , wherein the gate dielectric layer is in the form of a first layer comprising a majority of the polar block of the block copolymer and a second layer comprising a majority of the nonpolar block of the block copolymer, wherein the second layer is closer to the semiconductor layer than the first layer.

3. The transistor of claim 2 , wherein the first layer contains from about 60% to 100% by weight of the polar block, based on the total weight of the first layer.

4. The transistor of claim 2 , wherein the second layer contains from about 60% to 100% by weight of the nonpolar block, based on the total weight of in the second layer.

5. The transistor of claim 1 , wherein the gate dielectric layer is phase-separated into (i) a continuous phase comprising a majority of the nonpolar block of the block copolymer; and (ii) a discontinuous phase comprising a majority of the polar block of the block copolymer.

6. The transistor of claim 1 , wherein the block copolymer is crosslinked.

7. The transistor of claim 1 , wherein the gate dielectric layer further comprises inorganic nanoparticles, wherein a majority of the nanoparticles is dispersed in a phase formed from the polar block.

8. The transistor of claim 7 , wherein the inorganic nanoparticles are formed in-situ in the presence of the block copolymer.

9. The transistor of claim 1 , wherein the semiconducting layer comprises a polythiophene.

10. The transistor of claim 9 , wherein the polythiophene has one of the three following structures:

where R and R′ are independently selected from hydrogen, halogen, alkyl, alkoxyalkyl, siloxyalkyl, and perfluoroalkyl; M is a divalent linkage; and n is the degree of polymerization.

11. An organic thin film transistor comprising a substrate, a semiconductor layer, and a gate dielectric layer, wherein the gate dielectric layer consists of a block copolymer, wherein the block copolymer has a polar block and a nonpolar block, the polar block is bisphenol-A polycarbonate, and the nonpolar block is polydimethylsilane.

12. An organic thin film transistor comprising a substrate, a semiconductor layer, and a gate dielectric layer, wherein the gate dielectric layer consists of inorganic nanoparticles and a block copolymer, wherein the block copolymer has a polar block and a nonpolar block, the polar block is bisphenol-A polycarbonate, and the nonpolar block is polydimethylsilane.

Assignments (10)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2025
From: XEROX CORPORATION
To: GENESEE VALLEY INNOVATIONS, LLC
Reel/Frame 073842/0479 →
SECOND LIEN NOTES PATENT SECURITY AGREEMENT Recorded Jul 2, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 071785/0550 →
FIRST LIEN NOTES PATENT SECURITY AGREEMENT Recorded Apr 11, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 070824/0001 →
SECURITY INTEREST Recorded Feb 13, 2024
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 066741/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT RF 064760/0389 Recorded Feb 13, 2024
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: XEROX CORPORATION
Reel/Frame 068261/0001 →
SECURITY INTEREST Recorded Nov 20, 2023
From: XEROX CORPORATION
To: JEFFERIES FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 065628/0019 →
SECURITY INTEREST Recorded Jun 22, 2023
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 064760/0389 →
RELEASE OF SECURITY INTEREST IN PATENTS AT R/F 062740/0214 Recorded May 18, 2023
From: CITIBANK, N.A., AS AGENT
To: XEROX CORPORATION
Reel/Frame 063694/0122 →
SECURITY INTEREST Recorded Nov 10, 2022
From: XEROX CORPORATION
To: CITIBANK, N.A., AS AGENT
Reel/Frame 062740/0214 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 16, 2008
From: WU, YILIANG; ONG, BENG S.
To: XEROX CORPORATION
Reel/Frame 020370/0182 →