Insulated gate silicon carbide semiconductor device
View Patent ↗An insulated gate silicon carbide semiconductor device is provided having small on-resistance. The device combines a static induction transistor structure with an insulated gate field effect transistor structure. The advantages of both the SIT structure and the insulated gate field effect transistor structure are obtained. The structures are formed on the same SiC semiconductor substrate, with the MOSFET structure above the SIT structure. The SIT structure includes a p + gate region in an n-type drift layer on an n + SiC semiconductor substrate, and an n + first source region on the surface of the drift layer. The MOSFET structure includes a p-well region on the surface of the first source region, a second source region formed in the p-well region, and a MOS gate structure formed in a trench extending from the second source region to the first source region. The p + gate region and a source electrode are conductively connected.
1. An insulated gate silicon carbide semiconductor device comprising:
a first conduction-type high impurity concentration silicon carbide semiconductor substrate;
a first conduction-type silicon carbide semiconductor drift layer deposited on one principal plane of the substrate, the impurity concentration of the drift layer being lower than the impurity concentration of the substrate;
a static induction transistor structure including second conduction-type gate regions buried in the drift layer arranged at predetermined intervals in a direction parallel to the principal plane of the substrate and a first conduction-type first source region formed in the surface layer of the drift layer positioned at least above the predetermined interval;
a MOSFET structure including a second conduction-type well region deposited on the surface of the drift layer, a first conduction-type second source region formed in the surface layer of the second conduction-type well region, and a trench gate in a trench extending from the surface of the first conduction-type second source region through the second conduction-type well region to the first conduction-type first source region, the trench gate having a gate electrode buried in the trench via a gate insulating film that covers the sidewall of the trench; and
conductive connection mechanism that connects a source electrode coated on the surface including the surface of the second source region to the second conduction-type buried gate region;
wherein the impurity concentration of the first conduction-type first source region is greater than or equal to 1×10 18 cm −3 .
2. The insulated gate silicon carbide semiconductor device according to claim 1 , wherein the conductive connection mechanism that connects the source electrode and the second conduction-type buried gate region is a metal formed on the surface in a recess extending from the surface of the second conduction-type well region to the second conduction-type buried gate region.
3. The insulated gate silicon carbide semiconductor device according to claim 1 , wherein both the second conduction-type gate region and the trench gate have stripe shapes in the plan view, which are disposed parallel to each other.
4. The insulated gate silicon carbide semiconductor device according to claim 1 , wherein both the second conduction-type gate region and the trench gate have stripe shapes in the plan view, which are disposed perpendicular to each other.