IP Library Granted Patent US 8,411,375
Granted Patent B2
US 8,411,375 · App. 12/020,324 · Granted Apr 2, 2013

Method and apparatus providing gradient index of refraction lens for image sensors

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Quick Facts
Patent No.
US 8,411,375
App. No.
12/020,324
Granted
Apr 2, 2013
Kind
B2
Abstract

A lens and its method of making. The lens includes a material having a lower index of refraction and a material having a higher index of refraction arranged in a pattern such that the lens has a gradient effective index of refraction.

Claims (25)

1. An imaging device comprising:

a pixel array comprising a plurality of pixels, each pixel comprising:

a photosensor, and

a microlens arranged over the photosensor, wherein microlens comprises:

a first material having a first index of refraction; and

a second material having a second index of refraction, the first index of refraction being higher than the second index of refraction, wherein the first material and the second material are arranged in a pattern such that an effective index of refraction for the microlens is higher at a first position on the microlens than at a second position on the microlens and wherein the pattern is a subdiffraction pattern.

2. The imaging device of claim 1 , wherein the pattern comprises alternating concentric rings of the first material and the second material.

3. The imaging device of claim 2 , wherein a ratio of the width of a ring of the second material to the width of an adjacent ring of the first material is changed according to the distance of the rings from the center of the microlens.

4. The imaging device of claim 3 , wherein the rings of the first material and the rings of the second material are arranged in groups, each ring of the first material within a group having a same width as every other ring of the first material within the group.

5. The imaging device of claim 2 , wherein the width of the rings is between approximately 5 nm to approximately 40 nm.

6. The imaging device of claim 1 , wherein the pattern comprises columns of the first material arranged in the second material or columns of the second material arranged in the first material.

7. The imaging device of claim 6 , wherein the distance between the columns is changed according to the location of the columns on the microlens.

8. The imaging device of claim 6 , wherein the size of the columns is changed according to the distance of the columns from a center point of the microlens.

9. The imaging device of claim 8 , wherein the height of the columns is changed according to the location of the columns on the microlens.

10. The imaging device of claim 8 , wherein the width of the columns is changed according to the location of the columns on the microlens.

11. The imaging device of claim 6 , wherein the width of the columns is between approximately 5 nm to approximately 40 nm.

12. The imaging device of claim 1 , wherein the first material is arranged in a plurality of openings arranged in the second material.

13. The imaging device of claim 1 , wherein the second material is arranged in a plurality of openings arranged in the first material.

14. The imaging device of claim 1 , wherein the first material comprises nanoparticles.

15. The imaging device of claim 14 , wherein the nanoparticles comprise nanowires.

16. The imaging device of claim 1 , wherein the effective index of refraction is highest at a center of the microlens and is lower at a radial distance from the center.

17. An imaging device comprising: a pixel array comprising a plurality of pixels, each pixel comprising: a photosensor, and a microlens arranged over the photosensor, wherein the microlens comprises a first material having a first index of refraction and a second material having a second index of refraction, the first index of refraction being higher than the second index of refraction, wherein the first material and the second material are arranged in a subdiffraction pattern, and wherein the first material and the second material are arranged in concentric rings such that the effective index of refraction is higher at a first position on the lens than at a second position on the microlens, the first position being closer to a center of the microlens than the second position.

18. The imager device of claim 17 , wherein rings of the first material are wider according to their radial distance from the center of the microlens.

19. An imager device comprising: a pixel array comprising a plurality of pixels, each pixel comprising: a photosensor, and a microlens arranged over the photosensor, wherein the microlens comprises a first material having a first index of refraction and a second material having a second index of refraction, the first index of refraction being higher than the second index of refraction, wherein the first material and the second material are arranged in a subdiffraction pattern, wherein the first material is arranged in columns within the second material or wherein the second material is arranged in columns within the first material, and wherein the size of the columns is changed according to the radial distance of a column to a center of the microlens such that the effective index of refraction is higher at a first position on the microlens than at a second position on the microlens, the first position being closer to a center of the microlens than the second position.

20. The imager device of claim 19 , wherein the height or the width of the columns is increased according to their radial distance from the center of the microlens.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 28, 2009
From: MICRON TECHNOLOGY, INC.
To: APTINA IMAGING CORPORATION
Reel/Frame 023245/0186 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 25, 2008
From: LENCHENKOV, VICTOR
To: MICRON TECHNOLOGY, INC.
Reel/Frame 020418/0909 →