Process and apparatus for ultraviolet nano-imprint lithography
View Patent ↗A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.
1. An apparatus for producing a patterned substrate, the apparatus comprising: a vacuum chamber; a tilt and de-centering corrector received in the vacuum chamber, the tilt and de-centering corrector adjusting an alignment of an assembly of a substrate and a resin layer; a UV emitter provided on the tilt and de-centering corrector; and, a UV fiber source which supplies UV light to the UV emitter, wherein the apparatus produces a pattern on the substrate, the pattern being a replica of a template pattern provided on a mold, and the pattern on the substrate is made of the resin layer; wherein the tilt and de-centering corrector comprises: a base plate having on its upper surface a concave recess with a curvature; a loading plate disposed over the base plate; a ball placed between the base plate and the loading plate, the ball is in at least partial contact with the base plate and the loading plate; a centering guide disposed over the loading plate and formed with a nesting recess on an upper surface thereof, the centering guide receiving the assembly of the substrate and the resin layer; a plurality of centering guide rods disposed around the centering guide; a mold loading plate provided on the centering guide rod; and a mold arranged on the mold loading plate, the mold having a template pattern.
2. The apparatus as claimed in claim 1 , wherein the mold loading place is provided on the centering guide rod through an elastic means.
3. The apparatus as claimed in claim 1 , wherein the loading plate comprises a receiving recess and a guide member is mounted on the loading plate around the receiving recess.
4. The apparatus as claimed in claim 1 , wherein the concave recess has a width larger than that of the ball.
5. The apparatus as claimed in claim 1 , wherein the assembly of the substrate and the resin layer further comprises a pad made from polydimethylsiloxane.
6. The apparatus as claimed in claim 5 , wherein the assembly is received in the centering guide, the pad being placed on the bottom and the resin layer being placed on the top.
7. The apparatus as claimed in claim 1 , wherein the UV emitter comprises: a support member; a fitting member coupled to the support member; a UV emitting device coupled to an end of the fitting member; and a jig having a shaft provided inside thereof, the shaft applying pressure to the mold to bring the mold to be in contact with the assembly; wherein the fitting member is coupled to the jig.
8. The apparatus as claimed in claim 7 , wherein the support member has threads formed on inner circumference thereof; the fitting member is threaded into the support member; the UV emitting device having an end threaded into the fitting member; and the fitting member is threaded in the jig.
9. The apparatus as claimed in claim 7 , wherein the support member and the fitting member each have annular shapes.
10. The apparatus as claimed in claim 7 , further comprising a fine haze diffuser film (FHDF) mounted on an upper surface of the shaft.