Method of manufacturing organic light-emitting device and organic light-emitting device manufactured using the method
View Patent ↗A method of manufacturing an organic light-emitting device, the method including: forming an anode; forming an intermediate layer comprising an emission layer on the anode; and forming a cathode on the intermediate layer, wherein the forming of the cathode comprises thermally depositing indium or indium oxide, with at least one of a metal or a metal oxide in plasma generated in a chamber to form a transparent conductive layer of indium oxide doped with the at least one of the metal or the metal oxide.
1. A method of manufacturing an organic light-emitting device, the method comprising:
forming an anode;
forming an intermediate layer comprising an emission layer on the anode; and
forming a cathode on the intermediate layer,
wherein the forming the cathode comprises thermally depositing an indium oxide and at least one of a metal or a metal oxide in plasma generated in a chamber to form a transparent conductive layer in which the indium oxide is doped with the at least one of the metal or the metal oxide; and
wherein the at least one of the metal or the metal oxide is a material having a lower absolute work function value than that of the indium oxide.
2. The method of claim 1 , wherein, in the forming the cathode, a metal source and an indium source are thermally deposited under an oxygen atmosphere.
3. The method of claim 1 , wherein, in the forming the cathode, a metal source and an indium oxide source are thermally deposited under an argon atmosphere.
4. The method of claim 1 , wherein, in the forming the cathode, a metal oxide source and an indium oxide source are thermally deposited under an argon atmosphere.
5. The method of claim 1 , wherein, in the forming the cathode, a metal oxide source and an indium source are thermally deposited under an oxygen atmosphere.
6. The method of claim 1 , wherein, in the forming the cathode, a metal oxide source and an indium oxide source are thermally deposited under an oxygen atmosphere.
7. The method of claim 1 , wherein, in the foaming the cathode, a metal source and an indium source are thermally deposited under a mixed atmosphere of oxygen and argon.
8. The method of claim 1 , wherein, in the forming the cathode, a metal source and an indium oxide source are thermally deposited under a mixed atmosphere of oxygen and argon.
9. The method of claim 1 , wherein the at least one of the metal or the metal oxide comprises a metal selected from the group consisting of ytterbium (Yb), calcium (Ca), magnesium (Mg), samarium (Sm), cesium (Cs), barium (Ba), strontium (Sr), yttrium (Y), lanthanum (La), and combination thereof.
10. The method of claim 1 , wherein the at least one of the metal or the metal oxide comprises a metal oxide selected from the group consisting of strontium oxide, calcium oxide, cesium oxide, barium oxide, yttrium oxide, lanthanum oxide, and combination thereof.
11. A method of manufacturing an organic light-emitting device, the method comprising:
forming an anode;
forming an intermediate layer comprising an emission layer on the anode; and
forming a cathode on the intermediate layer,
wherein the forming the cathode comprises thermally depositing a metal, a metal oxide, and an indium oxide in plasma generated in a chamber to form a transparent conductive layer in which the indium oxide is doped with the metal and the metal oxide.
12. The method of claim 11 , wherein, in the forming the cathode, a metal source, a metal oxide source, and an indium oxide source are thermally deposited under an argon atmosphere.
13. The method of claim 11 , wherein, in the forming the cathode, a metal source and an indium source are thermally deposited under an oxygen atmosphere.
14. The method of claim 11 , wherein, in the forming the cathode, a metal source and an indium oxide source are thermally deposited under an oxygen atmosphere.
15. The method of claim 11 , wherein, in the forming the cathode, a metal source and an indium source are thermally deposited under a mixed atmosphere of oxygen and argon.
16. The method of claim 11 , wherein, in the forming the cathode, a metal source and an indium oxide source are thermally deposited under a mixed atmosphere of oxygen and argon.
17. The method of claim 11 , wherein, in the forming the cathode, a metal source, a metal oxide source, and an indium oxide source are thermally deposited under a mixed atmosphere of oxygen and argon.
18. The method of claim 11 , wherein each of the metal and the metal oxide is a material having a lower absolute work function value than that of the indium oxide.
19. The method of claim 11 , wherein the metal comprises a material selected from the group consisting of ytterbium (Yb), calcium (Ca), magnesium (Mg), samarium (Sm), cesium (Cs), barium (Ba), strontium (Sr), yttrium (Y), lanthanum (La), and combinations thereof.
20. The method of claim 11 , wherein the metal oxide comprises a material selected from the group consisting of strontium oxide, calcium oxide, cesium oxide, barium oxide, yttrium oxide, lanthanum oxide, and combinations thereof.