IP Library Granted Patent US 8,026,581
Granted Patent B2
US 8,026,581 · App. 12/025,976 · Granted Sep 27, 2011

Gallium nitride material devices including diamond regions and methods associated with the same

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Quick Facts
Patent No.
US 8,026,581
App. No.
12/025,976
Granted
Sep 27, 2011
Kind
B2
Abstract

Gallium nitride material structures are provided, as well as devices and methods associated with such structures. The structures include a diamond region which may facilitate conduction and removal of heat generated within the gallium nitride material during device operation. The structures described herein may form the basis of a number of semiconductor devices and, in particular, transistors (e.g., FETs).

Claims (13)

1. A gallium nitride material device structure comprising:

a gallium nitride material region;

a plurality of electrical contacts associated with the gallium nitride material region;

a diamond region formed over the plurality of electrical contacts and formed on at least one of the plurality of electrical contacts, wherein the plurality of electrical contacts include a source electrode, gate electrode and drain electrode, and the diamond region is formed on the source electrode, gate electrode and drain electrode, and wherein the diamond region is formed directly on the source electrode, gate electrode and drain electrode.

2. A gallium nitride material device structure comprising:

a gallium nitride material region;

a nucleation layer formed over the gallium nitride material region, the nucleation layer having a window defined therein exposing a portion of the gallium nitride material region;

a diamond region formed on the nucleation layer, wherein the gallium nitride material region in the window is substantially free of diamond being formed thereon, and wherein the nucleation layer enables formation of the diamond region thereon, wherein the device includes a source electrode, gate electrode and drain electrode, and the diamond region is formed over the source electrode, gate electrode and drain electrode, and wherein the diamond region is formed directly on source electrode, gate electrode and drain electrode.

3. A gallium nitride material device structure comprising:

a gallium nitride material region;

an electrical contact associated with the gallium nitride material region;

a heat sink;

a diamond region formed on the electrical contact, the diamond region arranged to conduct heat generated within the gallium nitride material region to the heat sink, wherein an electrically conductive pathway extends through the thickness of the gallium nitride material region, wherein the device includes a plurality of electrical contacts including a source electrode, gate electrode and drain electrode, and the diamond region is formed on the source electrode, gate electrode and drain electrode, and wherein the diamond region is formed directly on source electrode, gate electrode and drain electrode.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2019
From: INFINEON TECHNOLOGIES AMERICAS CORP.
To: MACOM TECHNOLOGY SOLUTIONS HOLDINGS, INC.
Reel/Frame 047908/0610 →
CHANGE OF NAME Recorded Jul 23, 2018
From: INTERNATIONAL RECTIFIER CORPORATION
To: INFINEON TECHNOLOGIES AMERICAS CORP.
Reel/Frame 046612/0968 →
CONFIDENTIAL EXCLUSIVE LICENSE AND IP PURCHASE AGREEMENTS THAT RESTRICT PATENT ASSIGNMENT BY CURRENT OWNER (ONLY NON-CONFIDENTIAL, PUBLIC MATERIALS SUMMARIZING AGREEMENTS AND LITIGATION DISPUTES RELATING TO THE SAME ATTACHED) Recorded Nov 3, 2017
From: INTERNATIONAL RECTIFIER CORPORATION
To: NITRONEX LLC; MACOM TECHNOLOGY SOLUTIONS HOLDINGS, INC.
Reel/Frame 044532/0627 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 9, 2010
From: NITRONEX CORPORATION
To: INTERNATIONAL RECTIFIER CORPORATION
Reel/Frame 024953/0770 →
RELEASE OF SECURITY INTEREST Recorded Aug 5, 2010
From: SILICON VALLEY BANK
To: NITRONEX CORPORATION
Reel/Frame 024794/0055 →
SECURITY AGREEMENT Recorded May 4, 2010
From: NITRONEX CORPORATION
To: SILICON VALLEY BANK
Reel/Frame 024320/0896 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 4, 2009
From: HANSON, ALLEN W.; PINER, EDWIN L.
To: NITRONEX CORPORATION
Reel/Frame 023048/0528 →