Compositions, layers and films for optoelectronic devices, methods of production and uses thereof

1. A crosslinkable composition, comprising:

at least one silicon-based material comprising at least one alkyl group and at least one aryl group, wherein the at least one aryl group comprises an aryl percent of carbon and the aryl percent of carbon is present in an amount greater than about 80% of the total carbon present in the at least one alkyl group and at least one aryl group;

at least one heat-activated condensation catalyst, wherein the catalyst comprises an ammonium compound, an amine, a phosphonium compound, a phosphine compound or a combination thereof;

at least one surfactant; and

at least one solvent.

2. The crosslinkable composition of claim 1 , wherein the at least one alkyl group comprises methyl.

3. The crosslinkable composition of claim 1 , wherein the at least one aryl or aromatic group comprises phenyl.

4. The crosslinkable composition of claim 1 , wherein the at least one alkyl group comprises an alkyl percent of carbon and the alkyl percent of carbon is present in an amount of less than about 20% of the total carbon present in the at least one alkyl group and at least one aryl group.

5. The crosslinkable composition of claim 4 , wherein the at least one alkyl group comprises an alkyl percent of carbon and the alkyl percent of carbon is present in an amount of less than about 10% of the total carbon present in the at least one alkyl group and at least one aryl group.

6. The crosslinkable composition of claim 4 , wherein the at least one aryl group comprises an aryl percent of carbon and the aryl percent of carbon is present in an amount of greater than about 90% of the total carbon present in the at least one alkyl group and at least one aryl group.

7. The crosslinkable composition of claim 1 , wherein the at least one silicon-based material comprises methylphenylsiloxane, methylphenylsilsesquioxane, polymethylphenylsiloxane, polymethylphenylsilsesquioxane or a combination thereof.

8. A crosslinked film formed from the composition of claim 1 .

9. The crosslinked film of claim 8 , wherein the film is etch resistant to at least one aggressive etch chemistry.

10. The crosslinked film of claim 9 , wherein the at least one aggressive etch chemistry comprises PRS2000, ST106, NMP or BOE.

11. An optoelectronic device comprising the crosslinked film of claim 8 .

12. The optoelectronic device of claim 11 , wherein the device comprises a transistor, a light emitting diode, a color filter, a stainless steel or plastic surface, a photovoltaic cell, a flat panel display, an electrophoretic display, an x-ray detector or a combination thereof.

13. The optoelectronic device of claim 11 , wherein the device comprises an active matrix thin film organic light emitting display, a passive matrix organic light emitting display, an active matrix thin film transistor liquid crystal display or a combination thereof.

14. The optoelectronic device of claim 12 , wherein the transistor comprises an amorphous silicon thin film transistor, a low temperature polysilicon transistor, an organic transistor, an organic field effect transistor, a static induction transistor, a crystalline silicon transistor or a combination thereof.

15. The optoelectronic device of claim 11 , wherein the crosslinked film has an optical transmittance greater than 95%.

16. The optoelectronic device of claim 11 , wherein the film has a thickness of up to about 3.5 micrometers.

17. The optoelectronic device of claim 16 , wherein the film has a thickness from about 2 micrometers to about 3.5 micrometers.

18. The crosslinked film of claim 8 , wherein the film does not absorb light in the visible region.

19. A crosslinkable composition, consisting essentially of:

at least one silicon-based material comprising at least one alkyl group and at least one aryl or aromatic group, wherein the at least one aryl or aromatic group comprises a percent of carbon present in the at least one aryl group, the percent of carbon is present in the at least one aryl group being greater than about 80% of the total carbon present in the at least one alkyl group and at least one aryl group;

at least one heat-activated condensation catalyst, wherein the catalyst comprises an ammonium compound, an amine, a phosphonium compound, a phosphine compound or a combination thereof;

at least one surfactant;

at least one solvent; and

optionally, at least one additive selected from at least one crosslinking agent, at least one adhesion promoter, and at least one additive designed to influence the surface tension, viscosity, density, transmittance, or transparency of the composition.

20. The crosslinkable composition of claim 19 , wherein the at least one aryl group comprises an aryl percent of carbon and the aryl percent of carbon is present in an amount of greater than about 90% of the total carbon present in the at least one alkyl group and at least one aryl group.

21. The crosslinkable composition of claim 19 , wherein the at least one alkyl group is methyl and the at least one aryl or aromatic group is phenyl.