Semiconductor device with resistor and fuse and method of manufacturing the same
View Patent ↗A fuse element is laminated on a resistor and the resistor is formed in a concave shape below a region in which cutting of the fuse element is carried out with a laser. Accordingly, there can be provided a semiconductor device which occupies a small area, causes no damage on the resistor in the cutting of the fuse element, has a small contact resistance occurred between elements, and has stable characteristics, and a method of manufacturing the same.
1. A semiconductor device, comprising:
a semiconductor substrate having a main surface;
a trench region formed in the main surface of the semiconductor substrate;
an insulating layer covering an inner surface of the trench region and the main surface of the semiconductor substrate;
a resistor formed on the insulating layer so as to extend from within the trench region onto the main surface of the semiconductor substrate;
a first oxide film embedded in the trench region so as to be flush with an upper surface of the resistor;
a fuse element formed on the first oxide film so as to overlie the resistor;
a second oxide film formed so as to cover the fuse element, the first oxide film, and the resistor; and
an interconnect layer formed on the second oxide film to be electrically connected with the resistor and the fuse element via a plug.
2. A semiconductor device according to Claim 1 , wherein the resistor is formed of a first polycrystalline silicon film.
3. A semiconductor device according to Claim 1 , wherein the fuse element is formed of a second polycrystalline silicon film.