Dual-side imprinting lithography system
View Patent ↗Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays.
1. A dual-side imprinting lithography system comprising:
a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin;
a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit;
a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit;
a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays;
a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays;
a chamber that accommodates the medium supporting unit, the first mold supporting unit, and the second mold supporting unit;
an X-Y stage that drives the second mold supporting unit in two-axis directions; and
a locking device that selectively fixes the second mold supporting unit and the medium supporting unit,
wherein the first mold supporting unit is fixedly installed in the chamber, the medium supporting unit is movably installed between the first mold supporting unit and the second mold supporting unit, and the vertical moving device drives the second mold supporting unit.
2. The dual-side imprinting lithography system of claim 1 , further comprising a vacuum apparatus connected to the chamber.
3. The dual-side imprinting lithography system of claim 1 , further comprising a linear guide installed above the chamber, wherein the first UV radiating device is installed on the linear guide.
4. The dual-side imprinting lithography system of claim 3 , further comprising an alignment optical device installed on the linear guide.
5. The dual-side imprinting lithography system of claim 1 , wherein the second UV radiating device is an optical path changing member that supplies UV rays received from the first UV radiating device to the second mold.
6. The dual-side imprinting lithography system of claim 5 , wherein the second UV radiating device comprise an annular concave mirror.
7. The dual-side imprinting lithography system of claim 5 , further comprising a UV reducing filter that is installed in a region where UV rays enter into the first mold from the first UV radiating device to reduce an intensity of the UV rays radiated onto the first mold.
8. The dual-side imprinting lithography system of claim 7 , wherein the UV reducing filter is a neutral density (ND) filter.
9. The dual-side imprinting lithography system of claim 1 , further comprising a rotation stage that rotates the second mold supporting unit.
10. The dual-side imprinting lithography system of claim 1 , further comprising a dual-side coating device that simultaneously coats the UV hardening resin on the both surfaces of the medium, wherein the dual-side coating device comprises:
a fixing chuck that fixes the medium;
a vertical driving unit that moves the fixing chuck vertically;
a rotation driving unit that rotates the fixing chuck; and
a resin storage unit that contains the UV hardening resin.