Method for fabricating inverted T-shaped floating gate memory
View Patent ↗A memory device having a floating gate with a non-rectangular cross-section is disclosed. The non-rectangular cross-section may be an inverted T shape, a trapezoid shape, or a double inverted T shape. Methods are disclosed for producing a floating gate memory device having an improved coupling ratio due to an increased surface area of the floating gate. The memory device has a floating gate having a cross-sectional shape, such as an inverted T shape, such that a top contour is not a flat line segment.
1. A method for forming a non-volatile memory device, comprising:
providing a substrate;
forming a tunnel layer over the substrate;
forming a conductive layer over the tunnel layer;
forming a cap layer on the conductive layer;
forming a plurality of trenches extending down through the cap layer, the conductive layer, the tunnel layer, and into the substrate;
filling the plurality of trenches with a dielectric material;
forming a dielectric layer having triangle-shaped peaks on the cap layer;
removing a portion of the dielectric layer to expose a first portion of the cap layer;
removing the first portion of the cap layer to expose a first portion of the conductive layer such that a cross-section of the cap layer and the conductive layer forms a plurality of structures;
removing the first portion of the conductive layer such that a cross-section of the conductive layer forms a plurality of conductive structures, wherein each of the conductive structures has a top portion and a bottom portion and wherein the top portion is narrower than the bottom portion;
forming an insulator layer over the conductive layer; and
forming a conductive line over the insulator layer.
2. The method of claim 1 , further comprising:
before the filling the plurality of trenches:
forming a liner dielectric layer over the plurality of trenches.
3. The method of claim 1 , wherein each of the plurality of conductive structures has one of an inverted T shape, a trapezoidal shape, and double inverted T shape.
4. A method for forming a non-volatile memory device, comprising:
providing a substrate;
forming a tunnel layer, a conductive layer and a plurality of trenches, wherein the tunnel layer is on the substrate, the conductive layer is on the tunnel layer, the trenches extend into the substrate to divide the substrate into a plurality of sections, and forming the tunnel layer and the conductive layer occurs before forming the plurality of trenches;
filling the plurality of trenches with a dielectric material to form a plurality of filled trench structures having sidewalls wherein each of the sections of the conductive layer is bounded by two adjacent sidewalls;
forming a disposable layer having triangle-shaped peaks over the conductive layer, wherein the base of each triangle-shaped peak is narrower than a width of each section;
using the triangle-shaped peak of the section as a mask to remove the portion of the section of the conductive layer;
removing a portion of a section of the conductive layer such that a cross-section of the section of the conductive layer forms an inverted T shape;
forming an insulator layer on the conductive layer; and
forming a conductive line on the insulator layer.
5. The method of claim 4 , further comprising:
before filling the plurality of trenches:
forming a liner dielectric layer over the plurality of trenches.
6. A method for forming a non-volatile memory device, comprising:
providing a substrate;
forming a plurality of trenches extending down into the substrate;
filling the plurality of trenches with a dielectric material;
forming a tunnel layer over the substrate;
forming a conductive layer over the tunnel layer;
forming a cap layer on the conductive layer;
removing a second portion of the cap layer and a second portion of the conductive layer to expose at least a portion of the plurality of trenches;
removing a portion of the cap layer to expose a first portion of the conductive layer such that a cross-section of the cap layer and the conductive layer forms a plurality of structures;
removing the first portion of the conductive layer such that a cross-section of the conductive layer forms a plurality of conductive structures, wherein each of the conductive structures has a top portion and a bottom portion and wherein the top portion is narrower than the bottom portion;
forming an insulator layer over the conductive layer; and
forming a conductive line over the insulator layer.
7. The method of claim 6 , further comprising:
before filling the plurality of trenches:
forming a liner dielectric layer over the plurality of trenches.
8. The method of claim 6 , wherein after the step of filling, further comprising:
after filling the plurality of trenches:
forming a dielectric layer having triangle-shaped peaks on the cap layer; and
removing a portion of the dielectric layer to expose the first portion of the cap layer.
9. The method of claim 8 , wherein each of the plurality of conductive structures has one of an inverted T shape, a trapezoidal shape, and double inverted T shape.
10. A method for forming a non-volatile memory device, comprising:
providing a substrate;
forming a tunnel layer, a conductive layer and a plurality of trenches, wherein the tunnel layer is on the substrate, the conductive layer is on the tunnel layer, the trenches extend into the substrate to divide the substrate into a plurality of sections, and forming the tunnel layer and the conductive layer occurs after forming the plurality of trenches;
filling the plurality of trenches with a dielectric material to form a plurality of filled trench structures having sidewalls wherein each of the sections of the conductive layer is bounded by two adjacent sidewalls;
forming a disposable layer having triangle-shaped peaks over the conductive layer, wherein the base of each triangle-shaped peak is narrower than a width of each section;
using the triangle-shaped peak of the section as a mask to remove a portion of a section of the conductive layer;
removing the portion of the section of the conductive layer such that a cross-section of the section of the conductive layer foams an inverted T shape;
forming an insulator layer on the conductive layer; and
forming a conductive line on the insulator layer.
11. The method of claim 10 , further comprising:
before filling the plurality of trenches:
forming a liner dielectric layer over the plurality of trenches.