IP Library Granted Patent US 7,605,013
Granted Patent B2
US 7,605,013 · App. 12/048,100 · Granted Oct 20, 2009

Photo-detector and related methods

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Quick Facts
Patent No.
US 7,605,013
App. No.
12/048,100
Granted
Oct 20, 2009
Kind
B2
Abstract

An apparatus comprising at least one multilayer wafer which includes a device layer adjacent to a barrier layer, and the device layer includes at least two photoconductive regions separated by an etched channel extending through the device layer. In some instances the apparatus may be an accelerometer having two photodiodes formed on a silicon-on-insulator (SOI) wafer with the photodiodes defined by one or more etched channels extending through the device layer of the SOI wafer. Also disclosed are methods for forming such an apparatus.

Claims (9)

1. A method of forming an apparatus including a plurality of photodiodes comprising: obtaining a multilayer wafer comprising at least a device layer separated from a handle layer by a barrier layer;

modifying the device layer to form a plurality of photoconductive regions;

separating the photoconductive regions by etching away the device layer between the photoconductive regions, wherein the etching step produces a separation of the photoconductive region wide enough to accommodate dicing by slicing or sawing without causing micro-fissures to extend into the separated photoconductive regions; and

forming a first plurality of electrically conductive pads or traces on the photoconductive regions.

2. The method of claim 1 further comprising wirebonding at least one wire to at least some of the first plurality of electrically conductive pads or traces.

3. The method of claim 2 wherein separating the photoconductive regions by etching away the device layer between the photoconductive regions comprises using reactive ion etching.

4. The method of claim 3 further comprising forming a second plurality of electrically conductive pads or traces on the device layer other than on the photoconductive regions.

5. The method of claim 4 wherein the second plurality of electrically conductive pads or traces is formed on the barrier layer.

6. The method of claim 5 further comprising electrically coupling at least some of the first plurality of electrically conductive pads or traces with at least some of the second plurality of electrically conductive pads or traces by wirebonding.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 7, 2011
From: NORTHROP GRUMMAN CORPORATION
To: NORTHROP GRUMMAN SYSTEMS CORPORATION
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