IP Library Granted Patent US 7,977,602
Granted Patent B2
US 7,977,602 · App. 12/051,732 · Granted Jul 12, 2011

Laser ablation using multiple wavelengths

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Quick Facts
Patent No.
US 7,977,602
App. No.
12/051,732
Granted
Jul 12, 2011
Kind
B2
Abstract

In laser micromachining and laser defect repair of a first material, a first set of one or more laser wavelengths is selected in accordance with the first material's absorption characteristics and is combined and delivered concurrently with a second set of one or more laser wavelengths which is selected in accordance with the absorption characteristics of a second material generated by and remaining from the ablating interaction of the first material with the first set of laser wavelengths. The concurrent presence of the second set of one or more laser wavelengths removes the residual second material.

Claims (9)

1. A method of micromachining/repairing a first material present over a substrate, the method comprising:

generating a laser beam, said laser beam comprising at least a first laser wavelength and at least a second laser wavelength concurrently present therein, said at least first wavelength being different than said at least second laser wavelength; and

directing the laser beam to the first material, said at least first laser wavelength being selected in accordance with an absorption characteristic of the first material to cause an ablation interaction of the first material with the at least first laser wavelength, said at least second laser wavelength being selected in accordance with an absorption characteristic of a second material generated by and remaining from the ablation interaction of the first material with the at least first laser wavelength, said at least second laser wavelength thereby causing a removal of the second material.

2. The method of claim 1 wherein said first material is a layer of material formed above the substrate.

3. The method of claim 1 wherein said first material is a defect present in a layer of material formed above the substrate.

4. The method of claim 1 wherein said first and second wavelengths of the laser beam are selected so as not to damage a layer positioned below the first material.

5. The method of claim 1 further comprising:

varying an amount of energy of each of the at least first and second wavelengths present in the laser beam.

6. The method of claim 1 wherein said substrate is a glass substrate.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 6, 2021
From: PHOTON DYNAMICS, INC.
To: ORBOTECH LTD.
Reel/Frame 055831/0793 →
RELEASE OF SECURITY INTEREST Recorded Jul 5, 2016
From: JPMORGAN CHASE BANK, N.A.
To: PHOTON DYNAMICS, INC.
Reel/Frame 039076/0165 →
SECURITY INTEREST Recorded Aug 14, 2014
From: PHOTON DYNAMICS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 033543/0631 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 13, 2008
From: BIRRELL, STEVEN EDWARD
To: PHOTON DYNAMICS, INC.
Reel/Frame 020943/0290 →