Method and apparatus for laser drilling holes with tailored laser pulses
View Patent ↗An improved method and apparatus for drilling vias in electronic substrates with laser pulses is presented which uses one or more tailored pulses to reduce debris remaining in the via while maintaining system throughput and avoiding damage to the substrate. A tailored pulse is a laser pulse that features a power spike having a peak power 10% higher than the average power of the pulse and lasting less than 50% of the duration of the pulse. Methods and apparatuses for creating tailored pulses by slicing longer duration pulses are shown.
1. An improved method for forming a via in an electronic substrate having a layer of conductive material and a layer of insulating material, including the steps of producing a laser pulse with a laser, and directing said laser pulse to impinge upon said electronic substrate, said directed laser pulse defined by pulse parameters, the improvement comprising the further steps of:
selecting at least one of said pulse parameters;
producing with said laser at least one laser pulse consistent with said at least one selected pulse parameter,
providing laser beam tailoring optics external to said laser to tailor said laser pulse,
tailoring said laser pulse with said tailoring optics, and;
directing said at least one tailored laser pulse to remove insulating material from an intended volume of said electronic substrate defining said via, without causing substantial damage to said substrate in the vicinity of said via thereby drilling said via, wherein at least one said selected pulse parameter being application of at least one tailored pulse, said tailored pulse including at least one power spike characterized by a peak power greater than about 20% above the average power of the pulse with a duration less than about 50% of the duration of the pulse.
2. The method of claim 1 where said at least one selected pulse parameter being pulse width, said pulse width being between 1 and 100 ns.
3. The method of claim 1 where said at least one selected pulse parameter being pulse fluence, said fluence being between 1.0 and 10.0 J/cm2.
4. An improved method for forming a via in an electronic substrate having a layer of conductive material and a layer of insulating material, including the steps of producing a laser pulse with a laser, and directing said laser pulse to impinge upon said electronic substrate, said directed laser pulse defined by pulse parameters, the improvement comprising the further steps of:
selecting at least one pulse parameter;
producing with said laser in cooperation with said optics at least one laser pulse consistent with said at least one selected pulse parameter,
providing laser beam tailoring optics external to said laser to tailor said laser pulse,
tailoring said laser pulse with said tailoring optics, and;
directing said at least one tailored laser pulse to remove insulating material from an intended volume of said electronic substrate defining said via, without causing substantial damage to said substrate in the vicinity of said via thereby drilling said via, wherein said selected pulse parameters include at least one tailored pulse, said tailored pulse including at least one power spike characterized by a peak power greater than about 20% above the average power of the pulse with a duration less than about 50% of the duration of the pulse, said selected pulse parameters further include at least one incubation pulse, said incubation pulse having peak power less than 50% of the average power of said tailored pulse.
5. The method of claim 4 where said at least one selected pulse parameter being pulse width, said pulse width being between 1 and 100 ns.
6. The method of claim 4 where said at least one selected pulse parameter being pulse fluence, said fluence being between 0.1 and 10.0 J/cm2.
7. An improved system for forming vias in electronic substrates with at least one laser pulse, said system including a controller, a laser, said substrates having both conductive and insulating layers, and said laser pulses defined by pulse parameters, the improvements comprising:
tailoring optics external to said laser operative to form tailored laser pulses, and;
a controller operatively connected to said laser and said tailoring optics to produce at least one laser pulse consistent with said pulse parameters and direct them to said substrate, said at least one laser pulse operative to remove insulating material from an intended volume of said electronic substrate defining said via, wherein said at least one pulse parameter being at least one tailored pulse, said tailored pulse including at least one power spike characterized by a peak power greater than about 20% above the average power of the pulse with a duration less than about 50% of the duration of the pulse.
8. The method of claim 7 where said at least one pulse parameter being pulse width, said pulse width being between 1 and 100 ns.
9. The method of claim 7 where said at least one pulse parameter being pulse fluence, said fluence being between 0.1 and 10.0 J/cm2.
10. An improved system for forming vias in electronic substrates with at least one laser pulse, said system including a controller, and a laser, said substrates having both conductive and insulating layers, and said at least one laser pulse defined by pulse parameters, said improvements comprising:
tailoring optics external to said laser operative to form tailored laser pulses, and;
a controller operatively connected to said laser and said tailoring optics to produce at least one laser pulse consistent with said pulse parameters and direct them to said substrate, said at least one laser pulse operative to remove insulating material from an intended volume of said substrate defining said via, wherein said at least one pulse parameter includes at least one tailored pulse, said tailored pulse includes at least one power spike characterized by a peak power greater than about 20% above the average power of the pulse with a duration less than about 50% of the duration of the pulse, said at least one pulse parameter further includes at least one incubation pulse, said incubation pulse having peak power less than 50% of the average power of said tailored pulse.
11. The method of claim 10 where said at least one pulse parameter includes pulse width, said pulse width being between 1 and 100 ns.
12. The method of claim 10 where said at least one pulse parameter includes pulse fluence, said fluence being between 0.1 and 10.0 J/cm2.
13. The method of claim 1 where the tailoring optics include an AOM.
14. The method of claim 1 where the tailoring optics include an EOM.
15. The method of claim 4 where the tailoring optics include an AOM.
16. The method of claim 4 where the tailoring optics include an EOM.
17. The method of claim 7 where the tailoring optics include an AOM.
18. The method of claim 7 where the tailoring optics include an EOM.
19. The method of claim 10 where the tailoring optics include an AOM.
20. The method of claim 10 where the tailoring optics include an EOM.