Optical substrate, light emitting element, display device and manufacturing methods thereof

1. A method of manufacturing an optical substrate comprising the steps of:

disposing a low refractive index layer over a transparent substrate, the refractive index of the low refractive index layer being lower than that of the transparent substrate;

coating a solgel film over the low refractive index layer; and

increasing the density of the solgel film by irradiation with ultraviolet rays after drying, whereby the solgel film has in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C, an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0;

wherein a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, is defined as Ra1>Ra2.

2. A method of manufacturing a light emitting element comprising the step of:

disposing a low refractive index layer over a transparent substrate;

coating a solgel film over the low refractive index layer;

increasing the density of the solgel film by irradiation with ultraviolet rays after drying; and

forming a light emitting element comprising:

a transparent substrate;

a low refractive index layer, whose refractive index is lower than that of the transparent substrate, disposed over the transparent substrate;

a solgel film disposed over the low refractive index layer, a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, being defined as Ra1>Ra2, said solgel film having in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C, an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0;

a first electrode over the solgel film;

a light emitting layer over the first electrode; and

a second electrode over the light emitting layer.

3. A method of manufacturing a display device comprising the step of:

disposing a low refractive index layer over a transparent substrate provided with a driving means;

coating a solgel film over the low refractive index layer;

increasing the density of the solgel film by irradiation with ultraviolet rays after drying; and

forming a light emitting element comprising:

a transparent substrate;

a low refractive index layer, whose refractive index is lower than that of the transparent substrate, disposed over the transparent substrate;

a solgel film disposed over the low refractive index layer, a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, being defined as Ra1>Ra2, said solgel film having in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C, an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0;

a first electrode over the solgel film;

a light emitting layer over the first electrode; and

a second electrode over the light emitting layer.

4. A method of manufacturing an optical substrate, comprising:

forming a low refractive index layer over a transparent substrate, the refractive index of the low refractive index layer being lower than that of the transparent substrate; and

forming a solgel film over the low refractive index layer by applying a sol solution containing an ingredient having an Si—O—C structure over the low refractive index layer, drying and conducting irradiation with ultraviolet rays to increase the density of the solgel film whereby the solgel film has in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C, an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0.

5. The method of manufacturing an optical substrate according to claim 4 , wherein a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, is defined as Ra1>Ra2.

6. The method of manufacturing an optical substrate according to claim 4 , wherein the Si—O—C structure has an Si-H group.

7. The method of manufacturing an optical substrate according to claim 4 , wherein the ingredient having an Si—O—C structure is an silicon based alkoxide.

8. The method of manufacturing an optical substrate according to claim 4 , wherein the low refractive index layer is a silica aerogel layer.

9. A method of manufacturing a light emitting element, comprising:

forming a low refractive index layer over a transparent substrate, the refractive index of the low refractive index layer being lower than that of the transparent substrate;

forming a solgel film over the low refractive index layer by applying a sol solution containing an ingredient having an Si—O—C structure over the low refractive index layer, drying and conducting irradiation with ultraviolet rays to increase the density of the solgel film whereby the solgel film has in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C, an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0;

forming a first electrode over the solgel film;

forming a light emitting layer over the first electrode; and

forming a second electrode over the a light emitting layer.

10. The method of manufacturing a light emitting element according to claim 9 , wherein a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, is defined as Ra1>Ra2.

11. The method of manufacturing a light emitting element according to claim 9 , wherein the Si—O—C structure has an Si-H group.

12. The method of manufacturing a light emitting element according to claim 9 , wherein the ingredient having an Si—O—C structure is an silicon based alkoxide.

13. The method of manufacturing a light emitting element according to claim 9 , wherein the low refractive index layer is a silica aerogel layer.

14. A method of manufacturing a display device, comprising:

forming a low refractive index layer over a transparent substrate provided with a driving means, the refractive index of the low refractive index layer being lower than that of the transparent substrate;

forming a solgel film over the low refractive index layer by applying a sol solution containing an ingredient having an Si—O—C structure over the low refractive index layer, drying and conducting irradiation with ultraviolet rays to increase the density of the solgel film whereby the solgel film has in the infrared absorption spectrum an absorption A of 1107±2 cm −1 in wave number attributable to Si—O—C an absorption B of 1070±2 cm −1 in wave number attributable to Si—O—Si, and an intensity ratio A/B between the absorption A and the absorption B ranging from 0.5 to 1.0;

forming a first electrode over the solgel film;

forming a light emitting layer over the first electrode; and

forming a second electrode over the a light emitting layer.

15. The method of manufacturing a display device according to claim 14 , wherein a relationship between a surface roughness of the low refractive index layer, represented by Ra1, and that of the solgel film over the low refractive index layer, represented by Ra2, is defined as Ra1>Ra2.

16. The method of manufacturing a display device according to claim 14 , wherein the Si—O—C structure has an Si—H group.

17. The method of manufacturing a display device according to claim 14 , wherein the ingredient having an Si—O—C structure is an silicon based alkoxide.

18. The method of manufacturing a display device according to claim 14 , wherein the low refractive index layer is a silica aerogel layer.