IP Library Granted Patent US 8,166,632
Granted Patent B1
US 8,166,632 · App. 12/057,611 · Granted May 1, 2012

Method for providing a perpendicular magnetic recording (PMR) transducer

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Quick Facts
Patent No.
US 8,166,632
App. No.
12/057,611
Granted
May 1, 2012
Kind
B1
Abstract

A method and system for providing a PMR transducer including an intermediate layer. The method and system include providing a hard mask layer on the intermediate layer. The hard mask layer is for a reactive ion etch of the intermediate layer. The method and system also include providing a bottom antireflective coating (BARC) layer on the hard mask layer. The BARC layer is also a masking layer for the hard mask layer. The method and system also include forming a trench in the intermediate layer using at least one reactive ion etch (RIE). The trench has a bottom and a top wider than the bottom. The method and system also include providing a PMR pole. At least a portion of the PMR pole resides in the trench.

Claims (47)

1. A method for providing a perpendicular magnetic recording (PMR) transducer including an intermediate layer, the method comprising:

providing a hard mask layer on the intermediate layer, the hard mask layer for a reactive ion etch of the intermediate layer, the intermediate layer being a nonmagnetic insulating layer;

providing a bottom antireflective coating (BARC) layer on the hard mask layer, the BARC layer further being a masking layer for the hard mask layer;

forming a trench in the intermediate layer using at least one reactive ion etch (RIE), the trench having a bottom and a top wider than the bottom; and

providing a PMR pole, at least a portion of the PMR pole residing in the trench.

2. The method of claim 1 wherein the BARC layer has a RIE selectivity of at least six for the hard mask layer.

3. The method of claim 2 wherein the RIE selectivity is at least eight.

4. The method of claim 1 wherein the hard mask layer has a RIE selectivity of at least seven for the intermediate layer.

5. The method of claim 4 wherein the RIE selectivity is at least ten.

6. The method of claim 1 wherein the BARC layer includes SiN.

7. The method of claim 1 wherein the hard mask layer includes at least one of Ru, Cr, and NiCr.

8. The method of claim 1 further comprising:

providing a nonmagnetic layer in the trench, at least a portion of the nonmagnetic layer residing in the trench, the PMR pole residing on the nonmagnetic layer.

9. The method of claim 1 further comprising:

providing a RIE stop layer under the intermediate layer, the RIE stop layer corresponding to at least a portion of the at least one RIE forming the trench in the intermediate layer.

10. The method of claim 1 wherein the BARC layer is the masking layer for a RIE of the hard mask layer.

11. A method for providing a perpendicular magnetic recording (PMR) transducer including an intermediate layer, the method comprising:

providing a hard mask layer on the intermediate layer, the hard mask layer for a reactive ion etch of the intermediate layer;

providing a bottom antireflective coating (BARC) layer on the hard mask layer, the BARC layer further being a masking layer for the hard mask layer;

forming a trench in the intermediate layer using at least one reactive ion etch (RIE), the trench having a bottom and a top wider than the bottom; and

providing a PMR pole, at least a portion of the PMR pole residing in the trench, wherein the step of forming the trench further includes:

providing a resist mask on the BARC layer, the resist mask having an aperture therein;

performing a first RIE having a first chemistry on the BARC layer to form a first aperture substantially aligned with the aperture in the resist mask; and

performing a second RIE having a second chemistry on the hard mask layer to form a second aperture substantially aligned with the first aperture.

12. The method of claim 11 wherein the first chemistry is different from the second chemistry.

13. The method of claim 12 wherein the second chemistry includes Cl.

14. The method of claim 11 wherein the resist mask has a thickness of not more than 0.3 microns.

15. The method of claim 14 wherein the resist mask has a thickness of not less than 0.1 microns.

16. A method for providing a perpendicular magnetic recording (PMR) transducer including an intermediate layer, the method comprising:

providing a hard mask layer on the intermediate layer, the hard mask layer for a reactive ion etch of the intermediate layer;

providing a bottom antireflective coating (BARC) layer on the hard mask layer, the BARC layer further being a masking layer for the hard mask layer;

forming a trench in the intermediate layer using at least one reactive ion etch (RIE), the trench having a bottom and a top wider than the bottom; and

providing a PMR pole, at least a portion of the PMR pole residing in the trench, wherein the providing the PMR pole further includes:

providing a planarization stop layer;

plating a PMR pole layer on the planarization stop layer; and

performing a planarization.

17. A method for providing a perpendicular magnetic recording (PMR) transducer comprising:

providing a reactive ion etch (RIE) stop layer;

providing an intermediate layer on the RIE stop layer, the RIE stop layer being insensitive to an intermediate layer RIE configured to etch the intermediate layer;

providing a hard mask layer on the intermediate layer, the hard mask layer for a RIE of the intermediate layer, the hard mask layer having a selectivity of at least seven for the intermediate layer;

providing a bottom antireflective coating (BARC) layer on the hard mask layer, the BARC layer further being a masking layer for the hard mask layer, the BARC layer having a selectivity of at least six for the hard mask layer;

providing a resist mask on the BARC layer, the resist mask having an aperture therein and a thickness of not more than 0.3 micron;

performing a first RIE having a first chemistry on the BARC layer to form a first aperture substantially aligned with the aperture in the resist mask;

performing a second RIE having a second chemistry on the hard mask layer to form a second aperture substantially aligned with the first aperture, the second chemistry being different from the first chemistry;

performing the intermediate layer RIE to form a trench in the intermediate layer, the trench having a bottom and a top wider than the bottom;

providing a nonmagnetic layer in the trench, at least a portion of the nonmagnetic layer residing in the trench; and

providing a PMR pole, at least a portion of the PMR pole residing in the trench, the PMR pole residing on the nonmagnetic layer.

Assignments (9)
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 038710 FRAME 0845 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL (FREMONT), LLC; WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 058965/0445 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 19, 2019
From: WESTERN DIGITAL (FREMONT), LLC
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 050450/0582 →
RELEASE OF SECURITY INTEREST Recorded Mar 5, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 045501/0158 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038744/0675 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038710/0845 →
SECURITY AGREEMENT Recorded May 16, 2016
From: WESTERN DIGITAL (FREMONT), LLC
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 038744/0755 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 12, 2008
From: ZHANG, JINQIU; HONG, LIUBO; SHEN, YONG; LI, DONGHONG
To: WESTERN DIGITAL (FREMONT), LLC
Reel/Frame 021089/0833 →