Method and apparatus for plasma-treating porous body
View Patent ↗A method for plasma-treating a porous body, comprising the steps of generating plasma using an inert gas or a mixed gas of an inert gas and a reactive gas, (a) blowing the resultant plasma gas to the porous body at a flow rate per a unit area of the porous body of 0.002 to 2 L/minute/cm 2 , (b) sucking the porous body in a plasma gas atmosphere, or (c) sucking the porous body while blowing the plasma gas to the porous body at said flow rate, thereby treating the plasma the surfaces and pores of said porous body with plasma.
1. An apparatus for plasma-treating a porous body in a chamber, comprising
(i) a plasma-gas-generating means, wherein the plasma-gas-generating means comprises a high-voltage electrode and a ground electrode, each of which are located on the same side of a porous body contained in a chamber;
(ii) a pipe for supplying a plasma-generating gas, which is an inert gas or a mixed gas of an inert gas and a reactive gas, to the generating means, and
(iii) a porous support contained in the chamber, the porous support being disposed at such a position that it receives pressure from a plasma gas flow supplied from the generating means, and the pressure of the plasma gas flow being applied to the porous body or the porous support in contact with the porous body.
2. The plasma-treating apparatus according to claim 1 , which further comprises a means for sucking the porous body or the porous support, the porous body or the porous support being sucked in a state where the porous body is in contact with the porous support.