Energy focusing system for active denial apparatus
View Patent ↗An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that allows the active denial apparatus to accurately immobilize targets at both close and long range within acceptable limits of intensity.
1. An active denial apparatus comprising:
a high-power millimeter wave source; and
at least one beam-processing element for directing radiated millimeter-wave energy along an axis of propagation, the at least one beam-processing element comprising an astigmatic focusing system configured to direct a focused, near-field beam having a focusing profile in a plane defined by a x-axis and a z-axis that includes an axis of propagation, and a substantially different focusing profile in a plane defined by a y-axis and the z-axis also including the axis of propagation that is perpendicular to the x-plane.
2. The active denial apparatus of claim 1 , wherein the astigmatic focusing system is configured to direct the focused, near-field beam with an effective cross-sectional area that is substantially constant over a wide range in the direction of propagation.
3. The active denial apparatus of claim 1 , wherein the focusing profile diverges in the plane defined by the x-axis and the z-axis and converges in the plane defined by the y-axis and the z-axis.
4. The active denial apparatus of claim 1 , wherein the at least one beam processing element includes a shaped reflector.
5. The active denial apparatus of claim 1 , wherein the at least one beam processing element includes a shaped transmissive lens.
6. The active denial apparatus of claim 1 , wherein the at least one beam-processing element further comprises a main reflector and a sub-reflector, the sub-reflector configured to match a size and a divergence of millimeter waves emanating from the high-power millimeter wave source to the main reflector to achieve desired focusing profiles in the plane defined by the x-axis and the z-axis and the plane defined by the y-axis and the z-axis, the main reflector configured to provide final focusing of the focused, near-field beam.
7. The active denial apparatus of claim 1 , wherein the at least one beam-processing element includes a flat-panel array antenna.
8. The active denial apparatus of claim 1 , wherein the at least one beam-processing element includes a phased array system.
9. The active denial apparatus of claim 1 , wherein the high-power millimeter-wave source includes a solid-state source.
10. The active denial apparatus of claim 9 , wherein the high-power millimeter-wave source includes a grid amplifier.
11. The active denial apparatus of claim 9 , wherein the high-power millimeter-wave source includes a grid oscillator.
12. The active denial apparatus of claim 1 , wherein the high-power millimeter-wave source includes a vacuum tube-based source.
13. A method of focusing energy in an active denial apparatus comprising:
generating millimeter-wave energy from a high-power millimeter-wave source; and
radiating directing the millimeter-wave energy along an axis of propagation, wherein at least one beam processing element for radiating the millimeter-wave energy includes an astigmatic focusing system configured to direct a focused, near field beam with a focusing profile in a plane defined by a x-axis and a z-axis, which contains an axis of propagation, the z-axis, and a substantially different focusing profile in a plane defined by a y-axis and the z-axis, which contains the axis of propagation, the z-axis, and is perpendicular to the plane defined by the x-axis and the z-axis.
14. The method of claim 13 , further comprising matching a size and a divergence of millimeter waves emanating from the high-power millimeter-wave source to a main reflector to achieve desired beam profiles in the plane defined by the x-axis and the z-axis and the plane defined by the y-axis and the z-axis, the main reflector configured to provide final focusing of the focused beam.
15. The method of claim 13 , wherein the radiating the millimeter-wave energy along the axis of propagation further comprises configuring a sub-reflector to match the size and the divergence of millimeter waves emanating from the high-power millimeter-wave source to the main reflector.
16. The method of claim 13 , wherein the radiating the millimeter-wave energy along the axis of propagation further comprises configuring the astigmatic focusing system so that the focusing profile diverges in the plane defined by the x-axis and the z-axis and converges in the plane defined by the y-axis and the z-axis.
17. The method of claim 13 , wherein the at least one beam processing element for radiating the millimeter-wave energy includes a shaped reflector.
18. The method of claim 13 , wherein the at least one beam processing element for radiating the millimeter-wave energy includes a shaped transmissive lens.
19. The method of claim 13 , wherein the at least one beam processing element for radiating the millimeter-wave energy includes a flat-panel array antenna.
20. The method of claim 13 , wherein the at least one beam processing element for radiating the millimeter-wave energy includes a phased array system.
21. The method of claim 13 , wherein the high-power millimeter-wave source includes a solid-state source.
22. The method of claim 21 , wherein the high-power millimeter-wave source includes a grid amplifier.
23. The method of claim 21 , wherein the high-power millimeter-wave source includes a grid oscillator.
24. The method of claim 13 , wherein the high-power millimeter-wave source includes a vacuum tube-based source.
25. The method of claim 13 , further comprising alternating the millimeter-wave energy between a plurality of fixed focus settings having either different effective apertures, different effective focal lengths in the plane defined by the x-axis and the z-axis, the plane defined by the y-axis and the z-axis, or both, or both different effective apertures and effective focal lengths.