Method for removing static electricity from a plate
A method for removing static electricity from a first plate in a processing chamber including a substrate on the first plate and a second plate opposite the first plate, the method includes generating static electricity in the first plate to adhere the substrate to the first plate, and supplying argon gas into the processing chamber to remove the static electricity.
1 . A method for removing static electricity from a first plate in a processing chamber including a substrate on the first plate and a second plate opposite the first plate, the method comprising:
generating static electricity in the first plate to adhere the substrate to the first plate; and
supplying argon gas into the processing chamber to remove the static electricity.
2 . The method as claimed in claim 1 , further comprising processing the substrate on the first plate.
3 . The method as claimed in claim 2 , wherein processing the substrate on the first plate includes forming at least one thin film thereon.
4 . The method as claimed in claim 3 , wherein forming the thin film includes depositing silver or silver alloy on the substrate.
5 . The method as claimed in claim 3 , wherein processing the substrate on the first plate further includes etching the thin film by using plasma.
6 . The method as claimed in claim 2 , wherein processing the substrate on the first plate includes forming silver or silver alloy electrodes thereon.
7 . The method as claimed in claim 1 , wherein generating static electricity includes applying voltage to the first plate
8 . The method as claimed in claim 7 , further comprising disconnecting the voltage from the first plate before supplying the argon gas.
9 . The method as claimed in claim 1 , wherein generating static electricity includes using an electrostatic chuck as a first plate.
10 . The method as claimed in claim 1 , further comprising detaching the substrate from the first plate by raising a lift pin through the first plate after removing the static electricity from the first plate.
11 . The as claimed in claim 1 , further comprising removing the substrate from the processing chamber after removing the static electricity from the first plate.