Method for forming pattern arrays and organic devices including the pattern arrays

1. A method for forming a pattern array, the method comprising:

forming a first hydrophobic thin film on a substrate;

removing a portion of the first hydrophobic thin film to form a first hydrophilic region and a first hydrophobic region;

coating a first organic solution onto the surface of the substrate including on the first hydrophilic region and the first hydrophobic region, and selectively wetting the first hydrophilic region with the first organic solution without wetting the first hydrophobic thin film in the first hydrophobic region;

drying the first organic solution to form a first organic thin film pattern in the first hydrophilic region without etching, wherein the first organic thin film pattern has a hemispherical shape;

forming a second hydrophobic thin film on the first organic thin film pattern, the second hydrophobic thin film covering side surfaces and a top surface of the first organic thin film pattern;

removing a portion of the second hydrophobic thin film to form a second hydrophilic region and a second hydrophobic region;

coating a second organic solution onto the surface of the substrate including on the second hydrophilic region and on the second hydrophobic region, and selectively wetting the second hydrophilic region with the second organic solution without wetting the second hydrophobic thin film in the second hydrophobic region; and

drying the second organic solution to form a second organic thin film pattern, wherein the second organic thin film pattern has a hemispherical shape,

wherein the first hydrophobic thin film is dissolved and removed when forming the second hydrophobic thin film.

2. The method of claim 1 , wherein

the thickness of the first hydrophobic thin film and that of the second hydrophobic thin film are less than about 400 nm.

3. The method of claim 2 , wherein

the thickness of the first hydrophobic thin film and that of the second hydrophobic thin film are more than about 10 nm.

4. The method of claim 1 , wherein

the first organic thin film pattern and the second organic thin film pattern are alternately disposed.

5. The method of claim 1 , wherein

the forming of the first hydrophobic thin film comprises coating a fluorine-containing polymer solution on the substrate, and

the forming of the first hydrophilic region comprises partially removing the fluorine from the first hydrophobic thin film.

6. The method of claim 5 , wherein

the forming of the second hydrophobic thin film comprises coating a fluorine-containing polymer solution on the first organic thin film pattern and the substrate, and

the forming of the second hydrophilic region comprises partially removing the fluorine from the second hydrophobic thin film.

7. The method of claim 6 , wherein

the removal of the fluorine from the first hydrophobic thin film and the second hydrophobic thin film comprises aligning a mask on the first hydrophobic thin film or the second hydrophobic thin film and irradiating optical energy thereto.

8. The method of claim 6 , further comprising

removing the second hydrophobic thin film after forming the second organic thin film pattern.

9. The method of claim 1 , wherein

the thickness of the second hydrophobic thin film is less than about 100 nm, and

the second organic solution is selectively wetted to overlap the first organic thin film pattern.

10. The method of claim 1 , wherein

the first organic thin film pattern and the second organic thin film pattern comprise a curable polymer material including dispersed pigments.

11. The method of claim 1 , wherein

the first organic thin film pattern and the second organic thin film pattern comprise a conjugated polymer.

12. The method of claim 1 , wherein

the first organic thin film pattern and the second organic thin film pattern have a convex shape.

13. The method of claim 1 , wherein

the first organic thin film pattern and the second organic thin film pattern have a flat surface at a central portion thereof.

14. A method for forming a pattern array, the method comprising:

forming a first hydrophobic thin film;

removing a portion of the first hydrophobic thin film to form a first hydrophilic region and a first hydrophobic region;

coating a first organic solution on the surface of the substrate including on the first hydrophilic region and the first hydrophobic region;

forming a first organic thin film pattern of the first organic solution in the first hydrophilic region without wetting the first hydrophobic thin film in the first hydrophobic region, wherein the first organic thin film pattern has a hemispherical shape;

forming a second hydrophobic thin film on the first organic thin film pattern and removing the first hydrophobic thin film, the second hydrophobic thin film covering side surfaces and a top surface of the first organic thin film pattern;

removing a portion of the second hydrophobic thin film to form the second hydrophilic region and a second hydrophobic region;

coating a second organic solution on the surface of the substrate including on the second hydrophilic region and the second hydrophobic region; and

forming a second organic thin film pattern of the second organic solution in the second hydrophilic region, wherein the second organic thin film pattern has a hemispherical shape,

wherein the first hydrophobic thin film is dissolved and removed when forming the second hydrophobic thin film.

15. The method of claim 14 , wherein

the first organic thin film pattern and the second organic thin film pattern are formed by using wettability of an organic solution.

16. The method of claim 15 , wherein

the thickness of the second hydrophobic thin film is more than about 10 nm.

17. The method of claim 16 , wherein

at least one of removing the first hydrophobic thin film and removing the second hydrophobic thin film includes aligning a mask on the first hydrophobic thin film or the second hydrophobic thin film and irradiating optical energy thereto.

18. The method of claim 15 , wherein

the thickness of the second hydrophobic thin film is less than about 100 nm, and

the second organic solution is selectively wetted to overlap the first organic thin film pattern.