A method comprises applying a first electric field pulse to a nanowire comprising a channel and a charge trapping region configured to control conductivity of the channel, the first electric field pulse having a first polarity and a relatively large magnitude of integral of electric field during the pulse and, thereafter, applying at least one further electric field pulse to the nanowire, each further electric pulse having a second, opposite polarity and each respective further electric field pulse having a relatively small magnitude of integral of electric field during the pulse.
1. An apparatus comprising:
a nanowire comprising a channel and a charge trapping region configured to control conductivity of the channel;
at least one gate configured to apply electric fields to the nanowire; and
a pulse generator configured to apply voltage pulses to the at least one gate so to apply a first electric field pulse to the nanowire, the pulse generator configured to apply the first electric field pulse having a first polarity and a relatively large magnitude of integral of electric field in the time domain during the pulse and, thereafter, to apply at least one further electric field pulse to the nanowire, each further electric pulse having a second, opposite polarity and each respective further electric field pulse having a relatively small magnitude of integral of electric field in the time domain during the pulse.
2. The apparatus according to claim 1 , comprising:
a bias generator configured to drive current through the channel after application of the voltage pulses.
3. The apparatus according to claim 1 , wherein the charge trapping region is disposed at a surface of the nanowire.
4. The apparatus according to claim 1 , wherein the charge trapping region includes charge trapping centres.
5. The apparatus according to claim 4 , wherein the charge trapping centres comprise surface states on the surface of the channel.
6. The apparatus according to claim 4 , wherein the charge trapping centres comprise interface states between the channel and an insulating material.
7. The apparatus according to claim 4 , wherein the charge trapping centres comprise ion impurities.
8. The apparatus according to claim 1 , wherein the charge trapping region includes an insulating material.
9. The apparatus according to claim 1 , wherein the channel comprises a semiconductor material.
10. The apparatus according to claim 9 , wherein the semiconductor material is crystalline.
11. The apparatus according to claim 9 , wherein the semiconductor material comprises silicon.
12. The apparatus according to claim 9 , wherein the charge trapping region includes a compound of the semiconductor material.
13. The apparatus according to claim 1 , wherein the nanowire has a smallest dimension of less than 1 μm.
14. The apparatus according to claim 13 , wherein the nanowire has a smallest dimension no more than 100 nm.
15. The apparatus according to claim 1 , wherein the at least one gate includes a back gate.
16. The apparatus according to claim 1 , wherein the at least one gate includes a top gate.
17. The apparatus according to claim 1 , wherein the at least one gate includes a side gate.
18. The apparatus according to claim 1 , wherein the pulse generator includes at least one other nanowire operatively connected to the at least one gate.
19. The apparatus according to claim 1 , further comprising a capacitor configured to drive current through the channel after application of the at least one further electric pulses.
20. An apparatus comprising:
at least two nanowires, each nanowire comprising a channel and a charge trapping region configured to control conductivity of the channel,
at least two gates, each gate configured to apply an electric field to a respective nanowire; and
at least one conductive element configured to be switchable between at least two non-volatile conductive states, wherein each conductive element is configured to pass a signal from at least one nanowire to a gate of another nanowire.
21. The apparatus according to claim 20 , further comprising:
at least one further gate configured to apply an electric field to the at least two nanowires.
22. The apparatus according to claim 20 , further comprising:
at least two capacitors, each capacitor configured to discharge through the channel of a respective nanowire.
23. An apparatus comprising:
a nanowire comprising a channel and a charge trapping region configured to control conductivity of the channel;
at least one gate configured to apply electric fields to the nanowire; and
means for applying voltage pulses to the at least one gate so to apply a first electric field pulse to the nanowire, the first electric field pulse having a first polarity and a relatively large magnitude of integral of electric field in the time domain during the pulse and, thereafter, for applying at least one further electric field pulse to the nanowire, each further electric pulse having a second, opposite polarity and each respective further electric field pulse having a relatively small magnitude of integral of electric field in the time domain during the pulse.