IP Library Granted Patent US 8,216,440
Granted Patent B2
US 8,216,440 · App. 12/081,018 · Granted Jul 10, 2012

Method for aligning microscopic structures and substrate having microscopic structures aligned, as well as integrated circuit apparatus and display element

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Quick Facts
Patent No.
US 8,216,440
App. No.
12/081,018
Granted
Jul 10, 2012
Kind
B2
Abstract

An object of the present invention is to implement a method for aligning microscopic structures in desired locations and in a desired direction, in order to align microscopic structures, such as nanostructures, with high precision. The method includes a substrate forming step of forming three electrodes to which independent potentials can be applied, a microscopic structure liquid applying step of applying a liquid in which microscopic structures are dispersed to the insulating substrate, and a microscopic structure aligning step of applying respective voltages to the three electrodes to align the microscopic structures in locations defined by the electrodes.

Claims (29)

1. A method for aligning microscopic structures, comprising:

a substrate preparing step of defining one microscopic structure-aligning region having as a unit three electrodes to which independent potentials are applied and preparing an insulating substrate having one or more of the microscopic structure-aligning regions formed;

a microscopic structure applying step of applying a liquid including microscopic structures ranging from a nano scale to a micron scale on said insulating substrate; and

a microscopic structure aligning step of applying respective voltages to said three electrodes to align said microscopic structures in the microscopic structure-aligning regions defined by the electrodes.

2. The method for aligning microscopic structures according to claim 1 , wherein said microscopic structures are aligned mainly in a direction perpendicular to a direction in which said electrodes are formed.

3. The method for aligning microscopic structures according to claim 1 , wherein said microscopic structures are aligned in locations separated by a distance beyond a repulsive force generated by a charge induced in the microscopic structures.

4. The method for aligning microscopic structures according to claim 1 , wherein

a first electrode and a second electrode among said three electrodes define said microscopic structure-aligning region,

a third electrode is placed between said first and second electrodes in said microscopic structure-aligning region, and

a reference potential is applied to said third electrode and alternating current potentials are applied to said first and second electrodes during said microscopic structure aligning step.

5. The method for aligning microscopic structures according to claim 4 , wherein

the alternating current potentials applied to said first and second electrodes have the same frequency and a phase difference of 150 to 210°.

6. The method for aligning microscopic structures according to claim 4 , wherein an average of the potentials applied to said first and second electrodes is different from the reference potential applied to the third electrode.

7. The method for aligning microscopic structures according to claim 4 , wherein

an offset voltage applying operation for applying an offset voltage for the third electrode to said first and second electrodes is carried out during said microscopic structure aligning step.

8. The method for aligning microscopic structures according to claim 7 , wherein a time difference in applying the offset voltage to said first and second electrodes is 0.1 second or less in said offset voltage applying operation.

9. The method for aligning microscopic structures according to claim 7 , wherein the offset voltages applied to said first and second electrodes are equal in said offset voltage applying operation.

10. The method for aligning microscopic structures according to claim 7 , wherein said offset voltage applying operation is repeated.

11. The method for aligning microscopic structures according to claim 10 , wherein said offset voltage applying operation is carried out at intervals of 1 to 10 seconds.

12. A method for aligning microscopic structures, comprising:

a substrate preparing step of defining one microscopic structure-aligning region having as an unit three electrodes including fourth, fifth and sixth electrodes to which independent potentials are applied and preparing an insulating substrate having one or more of the microscopic structure-aligning regions formed;

a microscopic structure applying step of applying a liquid including microscopic structures ranging from a nano scale to a micron scale on the insulating substrate; and

a microscopic structure aligning step of applying voltages to said three electrodes to align the microscopic structures in the microscopic structure-aligning regions defined by the electrodes, wherein

the microscopic structure aligning step includes a first microscopic structure aligning step of aligning first microscopic structures across the fourth and fifth electrodes, and a second microscopic structure aligning step of aligning second microscopic structures across the fifth and sixth electrodes,

in the first microscopic structure aligning step, a reference potential is applied to said fifth and sixth electrodes and a potential that is different from the reference potential is applied to the fourth electrode, and

in the second microscopic structure aligning step, a reference potential is applied to said fourth and fifth electrodes and a potential that is different from the reference potential is applied to the sixth electrode.

13. The method for aligning microscopic structures according to claim 12 , wherein an offset voltage for the fourth and fifth electrodes is applied to the sixth electrode during said first microscopic structure aligning step.

14. The method for aligning microscopic structures according to claim 12 , wherein said microscopic structures are aligned mainly in a direction perpendicular to a direction in which said electrodes are formed.

15. The method for aligning microscopic structures according to claim 12 , wherein said microscopic structures are aligned in locations separated by a distance beyond a repulsive force generated by a charge induced in the microscopic structures.

Assignments (3)
RELEASE OF SECURITY INTEREST IN INTELLECTUAL PROPERTY COLLATERAL AT REEL/FRAME NO. 49170/0482 Recorded Jul 1, 2021
From: OCEAN II PLO, LLC, AS AGENT
To: NANOSYS, INC.
Reel/Frame 056752/0073 →
SECURITY INTEREST Recorded Jan 17, 2019
From: NANOSYS, INC.
To: OCEAN II PLO, LLC
Reel/Frame 049170/0482 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 9, 2008
From: SHIBATA, AKIHIDE; OKADA, YASUNOBU
To: SHARP KABUSHIKI KAISHA; NANOSYS, INC.
Reel/Frame 020821/0817 →