IP Library Granted Patent US 9,044,707
Granted Patent B2
US 9,044,707 · App. 12/085,205 · Granted Jun 2, 2015

Microwave plasma abatement apparatus

Inventors: Marilena Radoiu (Lyons, FR); James Robert Smith (Taunton, GB); Andrew James Seeley (Bristol, GB)
Assignee: Edwards Limited
B01D53/32B01J19/126B01D53/007B01D2259/806B01D2259/818
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,044,707
App. No.
12/085,205
Granted
Jun 2, 2015
Kind
B2
Abstract

In a method of operating a microwave plasma abatement apparatus comprising a microwave generator, and a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, the amount of microwave energy that is not absorbed within the gas chamber is monitored, and the power of the microwave energy generated by the microwave generator is adjusted in dependence on the monitored microwave energy.

Claims (44)

1. A microwave plasma abatement apparatus comprising:

a microwave generator;

a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, wherein the gas chamber comprises a gas inlet for receiving a gas stream and a gas outlet;

a waveguide connected between the microwave generator and the gas chamber, wherein the waveguide includes a waveguide isolator, and wherein the waveguide isolator generates at least one magnetic field to prevent reflected microwave radiation from travelling back to the microwave generator from the gas chamber;

a detector located in the waveguide isolator, wherein the detector is configured to monitor an amount of the microwave energy that is not absorbed within the gas chamber; and

a controller configured to adjust the power of the microwave energy generated by the microwave generator in dependence on an output from the detector and a change in the gas stream to reduce the amount of microwave energy that is not absorbed within the gas chamber while maintaining a gas destruction efficiency of the microwave plasma abatement apparatus at or above a predetermined level.

2. The apparatus of claim 1 , wherein the detector is configured to detect the power of microwave energy reflected from the gas chamber.

3. The apparatus of claim 2 , wherein the waveguide is configured to convey microwave radiation from the microwave generator to the gas chamber.

4. The apparatus according to claim 1 , wherein the controller is configured to periodically adjust the power of the microwave energy generated by the microwave generator in dependence on the output from the detector and the change in the gas stream.

5. The apparatus of claim 1 , wherein the controller is configured to adjust the power of the microwave energy generated by the microwave generator in dependence on the output from the detector and a change in the mass flow rate of the gas stream entering the gas chamber.

6. The apparatus of claim 1 , wherein the controller is configured to adjust the power of the microwave energy generated by the microwave generator in dependence on the output from the detector and a change in the composition of the gas stream entering the gas chamber.

7. The apparatus of claim 1 , wherein the controller is configured to vary the power of the microwave energy generated by the microwave generator, monitor the output from the detector as the power is varied, and determine an optimal power for the microwaves generated by the microwave generator in dependence on the output.

8. A microwave plasma abatement apparatus for treating gas exhausted from a plurality of process chambers, the apparatus comprising:

a microwave generator;

a waveguide for conveying microwave energy from the microwave generator to a gas chamber for receiving the gas and within which a plasma is generated using the microwave energy, wherein the waveguide comprises a waveguide isolator;

a detector located in the waveguide isolator, wherein the detector is configured to detect the amount of the microwave energy that is not absorbed within the gas chamber during treatment of the gas within the gas chamber, and wherein the waveguide isolator generates at least one magnetic field to prevent reflected microwave radiation from travelling back to the microwave generator from the gas chamber; and

a controller configured to adjust the power of the microwave energy generated by the microwave generator in dependence on an output from the detector to reduce the amount of microwave energy that is not absorbed within the gas chamber while maintaining a gas destruction efficiency of the microwave plasma abatement apparatus at or above a predetermined level.

9. The apparatus of claim 8 , wherein the gas chamber comprises a microwave resonant cavity.

10. A method of operating a microwave plasma abatement apparatus comprising a microwave generator, a gas chamber for receiving microwave energy from the microwave generator and within which a plasma is generated using the microwave energy, and a waveguide connected between the microwave generator and the gas chamber, wherein the waveguide includes a waveguide isolator, and wherein the gas chamber comprises a gas inlet for receiving a gas stream and a gas outlet, the method comprising:

monitoring the amount of the microwave energy that is not absorbed within the gas chamber via a detector disposed within the waveguide isolator, wherein the waveguide isolator generates at least one magnetic field to prevent reflected microwave radiation from travelling back to the microwave generator from the gas chamber;

monitoring a change in the gas stream entering the gas chamber;

adjusting the power of the microwave energy generated by the microwave generator in dependence on the amount of unabsorbed microwave energy and the change in the gas stream to reduce the amount of microwave energy that is not absorbed within the gas chamber while maintaining a gas destruction efficiency of the microwave plasma abatement apparatus at or above a predetermined level.

11. The method of claim 10 , wherein:

monitoring the amount of microwave energy that is not absorbed within the gas chamber comprises monitoring the power of microwave energy reflected from the gas chamber, and

adjusting the power of the microwave energy generated by the microwave generator comprises adjusting the power of the microwave energy generated by the microwave generator in dependence on the reflected power and the change in the gas stream.

12. The method of claim 10 , wherein adjusting the power of the microwave energy generated by the microwave generator comprises periodically adjusting the power of the microwave energy generated by the microwave generator in dependence on the amount of unabsorbed microwave energy and the change in the gas stream.

13. The method of claim 10 , wherein adjusting the power of the microwave energy generated by the microwave generator comprises adjusting the power of the microwave energy generated by the microwave generator in dependence on a change in the mass flow rate of the gas stream entering the gas chamber and the amount of unabsorbed microwave energy.

14. The method of claim 10 , wherein adjusting the power of the microwave energy generated by the microwave generator comprises adjusting the power of the microwave energy generated by the microwave generator in dependence on a change in the composition of the gas stream entering the gas chamber and the amount of unabsorbed microwave energy.

15. The method of claim 10 , further comprising varying the power of the microwave energy generated by the microwave generator, monitoring the amount of microwave energy that is not absorbed within the gas chamber as the power is varied, and determining an optimal power for the microwaves generated by the microwave generator in dependence on the unabsorbed amount of microwave energy.

16. A method of treating a gas stream, comprising:

conveying the gas stream to a gas chamber;

supplying microwave energy via a waveguide to the gas chamber to generate a plasma within the gas chamber, wherein the waveguide comprises a waveguide isolator;

detecting the amount of the microwave energy that is not absorbed within the gas chamber via a detector disposed within the waveguide isolator, wherein the waveguide isolator generates at least one magnetic field to prevent reflected microwave radiation from travelling back to the microwave generator from the gas chamber; and

adjusting the power of the microwave energy supplied to the gas chamber in dependence on the amount of unabsorbed microwave energy to reduce the amount of microwave energy that is not absorbed within the gas chamber while maintaining a gas destruction efficiency at or above a predetermined level.

17. The method of claim 16 , wherein:

detecting the amount of microwave energy that is not absorbed within the gas chamber comprises monitoring the power of microwave energy reflected from the gas chamber, and

wherein adjusting the power of the microwave energy supplied to the gas chamber comprises adjusting the power of the microwave energy supplied to the chamber in dependence on the reflected power.

18. The method of claim 16 , wherein adjusting the power of the microwave energy supplied to the gas chamber comprises periodically adjusting the power of the microwave energy supplied to the chamber in dependence on the amount of unabsorbed microwave energy.

19. The method of claim 16 , wherein:

the gas chamber comprise a gas inlet for receiving the gas stream and a gas outlet, and

wherein adjusting the power of the microwave energy supplied to the gas chamber comprises adjusting the power of the microwave energy supplied to the chamber in dependence on a change in the gas stream entering the gas chamber and the amount of unabsorbed microwave energy.

20. The method of claim 19 , wherein adjusting the power of the microwave energy supplied to the chamber in dependence on a change in the gas stream entering the gas chamber and the amount of unabsorbed microwave energy comprises adjusting the power of the microwave energy supplied to the gas chamber in response to a change in the mass flow rate of the gas stream entering the gas chamber and the amount of unabsorbed microwave energy.

21. The method according to claim 19 , wherein adjusting the power of the microwave energy supplied to the chamber in dependence on a change in the gas stream entering the gas chamber and the amount of unabsorbed microwave energy comprises comprising adjusting the power of the microwave energy supplied to the gas chamber in response to a change in the composition of the gas stream entering the gas chamber and the amount of unabsorbed microwave energy.

22. The method of claim 16 , further comprising varying the power of the microwave energy supplied to the gas chamber, monitoring the amount of microwave energy that is not absorbed within the gas chamber as the power is varied, and determining an optimal power for the microwaves supplied to the chamber in dependence on the unabsorbed amount of microwave energy.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 26, 2009
From: RADOIU, MARILENA; SMITH, JAMES ROBERT; SEELEY, ANDREW JAMES
To: EDWARDS LIMITED
Reel/Frame 023421/0824 →
Priority Claims (1)
GB 0523947.0 · Nov 24, 2005 · national
Continuity (1)
Related Publication 20100038230A1 · Feb 18, 2010