IP Library Granted Patent US 8,304,847
Granted Patent B2
US 8,304,847 · App. 12/092,226 · Granted Nov 6, 2012

Semiconductor pressure sensor

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Quick Facts
Patent No.
US 8,304,847
App. No.
12/092,226
Granted
Nov 6, 2012
Kind
B2
Abstract

An object of the present invention is to solve problems in that aluminum electrodes, aluminum wires, and I/O terminals are corroded by corrosive gasses when a pressure of a pressure medium containing corrosive matters such as exhaust gas is measured with a semiconductor sensor; and improve not only the corrosion resistance of the sensor chip but also the corrosion resistance of the portion particularly functioning as the pressure receiver. Each of the aluminum electrodes that is likely to be corroded portions is prevented from being corroded by forming a titanium-tungsten layer and gold layer on the aluminum electrode. The connecting wires are prevented from being corroded by corrosive matters by using gold wires. The I/O terminals are also prevented from being corroded by applying gold plating.

Claims (29)

1. A semiconductor pressure sensor for measuring pressure of an exhaust gas of a combustion engine, the exhaust gas containing corrosive components, wherein:

the whole area of a semiconductor chip, except for pads for wire bonding and probe pads for characteristic confirmatory check which function as electrical input and output portions, is coated with a corrosion-resistant material such as silicon nitride;

an adhesion ensuring-diffusion preventative layer is formed on aluminum electrodes at the pads for wire bonding and the probe pads;

the surface of the adhesion ensuring-diffusion preventative layer is coated with gold;

the adhesion ensuring-diffusion preventive layer is made of tungsten-titanium;

the tungsten-titanium layer as the adhesion ensuring-diffusion preventative layer covers over the whole of a top face of each aluminum electrode and spreads across a boundary between the aluminum electrode and the silicon nitride layer as the corrosion-resistant material so as to overhang the silicon nitride layer; and

the gold coating spreads across a boundary between the adhesion ensuring-diffusion preventative layer of tungsten-titanium and the corrosion-resistant material of silicon nitride.

2. The semiconductor pressure sensor according to claim 1 , wherein the adhesion ensuring-diffusion preventative layer has a thickness of about 0.25 μm and is configured so as to overhang the silicon nitride.

3. The semiconductor pressure sensor according to claim 1 , wherein:

said electrical input and output portions of the semiconductor chip are connected to external input and output terminals with gold wires, respectively; and

the surfaces of the external input and output terminals are coated with gold.

4. The semiconductor pressure sensor according to claim 1 , wherein said gold coating is formed by sputtering, plating, or both sputtering and plating.

5. The semiconductor pressure sensor according to claim 4 , wherein the thickness of the gold coating is at least 0.5 μm.

6. The semiconductor pressure sensor according to claim 1 , wherein the semiconductor chip is bonded to glass with anodic bonding at a temperature not higher than 320° C.

7. The semiconductor pressure sensor according to claim 1 , wherein a surface of the adhesion ensuring-diffusion preventative layer is coated with gold after the semiconductor chip is bonded to glass with anodic bonding.

8. The semiconductor pressure sensor according to claim 1 , wherein the semiconductor pressure sensor is configured so that parts of aluminum of the lower portions of the aluminum electrodes to which wire bonding is applied may be cut out in order to prevent the adhesion ensuring-diffusion preventative layer from being damaged due to the application of vibration at the gold coating.

9. A semiconductor pressure sensor for measuring pressure in an engine exhaust gas that contains corrosive components, said pressure sensor comprising:

a semiconductor chip;

electrical connection pads arrayed on a surface of said semiconductor chip;

a corrosion resistant layer which covers the entire surface of the semiconductor chip, except for the electrical connection pads;

aluminum electrodes formed at the electrical connection pads on said semiconductor chip;

an adhesion ensuring-diffusion preventative layer formed on said aluminum electrodes; and

a gold coating on the surface of the adhesion ensuring-diffusion preventative layer; wherein,

said corrosion resistant layer is formed silicon nitride;

said adhesion ensuring-diffusion preventative layer is formed of tungsten-titanium;

the tungsten-titanium layer as the adhesion ensuring-diffusion preventative layer covers over the whole of a top face of each aluminum electrode and spreads across a boundary between the aluminum electrode and the silicon nitride layer as the corrosion-resistant material so as to overhang the silicon nitride layer; and

the gold coating spreads across a boundary between the adhesion ensuring-diffusion preventative layer of tungsten-titanium and the corrosion-resistant layer of silicon nitride.

10. The semiconductor pressure sensor according to claim 1 , wherein a thickness of the gold coating formed on the surface of the adhesion ensuring-diffusion preventative layer is thicker than a thickness of the adhesion ensuring-diffusion preventative layer formed on the aluminum electrodes.

11. The semiconductor pressure sensor according to claim 9 , wherein a thickness of the gold coating formed on the surface of the adhesion ensuring-diffusion preventative layer is thicker than a thickness of the adhesion ensuring-diffusion preventative layer formed on the aluminum electrodes.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 31, 2011
From: HITACHI, LTD.
To: FUJI ELECTRIC CO., LTD.
Reel/Frame 027146/0679 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE'S ADDRESS PREVIOUSLY RECORDED ON REEL 024006 FRAME 0481. ASSIGNOR(S) HEREBY CONFIRMS THE FUJI ELECTRIC SYSTEMS CO., LTD. (CO-OWNERSHIP) 11-2, OSAKI 1-CHOME SHINAGAWA-KU, TOKYO JAPAN 141-0032. Recorded Mar 3, 2010
From: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (CO-OWNERSHIP)
To: FUIJ ELECTRIC SYSTEMS CO., LTD. (CO-OWNERSHIP)
Reel/Frame 024016/0778 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2010
From: FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (CO-OWNERSHIP)
To: FUJI ELECTRIC SYSTEMS CO., LTD. (CO-OWNERSHIP)
Reel/Frame 024006/0481 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 8, 2008
From: KAMINAGA, TOSHIAKI; HAYASHI, MASAHIDE; UEYANAGI, KATSUMICHI; SAITO, KAZUNORI; NISHIKAWA, MUTSUO
To: HITACHI, LTD.; FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD.
Reel/Frame 021362/0054 →