Exposure apparatus and device manufacturing method
View Patent ↗An exposure apparatus for exposing a substrate through a reticle. The apparatus includes a chamber in which an exposure process is to be carried out, a circulation system configured to circulate a gas through the chamber, a supplying system configured to supply water, supplied from a facility, to a heat source inside the exposure apparatus, and a heat exchanger configured to perform heat exchange between a gas discharged out of the chamber by the circulation system and the water to be supplied to the heat source by the supplying system.
1. An exposure apparatus for exposing a substrate through a reticle, said apparatus comprising:
a chamber in which an exposure process is to be carried out;
a circulation system configured to circulate, within said exposure apparatus, a gas through said chamber;
a supplying system configured to supply water, supplied from a facility, to a heat source inside said exposure apparatus;
a heat exchanger configured to perform heat exchange between a gas discharged out of said chamber by said circulation system and the water supplied to the heat source by said supplying system;
a temperature sensor for measuring a temperature of the water, at a position downstream of said heat exchanger and upstream of the heat source, with respect to the flow of water of said supplying system,
wherein said circulation system includes (i) a first path that extends through said heat exchanger, (ii) a second path that bypasses said heat exchanger, and (iii) a valve mechanism configured to adjust a flow amount of the gas passing through the first path; and
a controller for controlling said valve mechanism on the basis of a measurement made by said temperature sensor.
2. An apparatus according to claim 1 , further comprising a cooling device configured to cool a gas and a heating device for heating the gas cooled by said cooling device, each of said cooling device and said heating device being disposed at a position downstream of said heat exchanger and upstream of said chamber with respect to the flow of water of said supplying system.
3. A device manufacturing method, comprising the steps of:
exposing a substrate to light through a reticle by use of an exposure apparatus as recited in claim 1 ;
developing the exposed substrate; and
processing the developed substrate to produce a device.
4. An exposure apparatus for exposing a substrate through a reticle, said apparatus comprising:
a chamber in which an exposure process is to be carried out;
a temperature adjusting device connected to a gas-flow inlet port and a gas-flow outlet port provided in said chamber, and configured to adjust a temperature of a gas inside said chamber;
a circulation system configured to circulate the gas through said chamber and said temperature adjusting device;
a supplying system configured to supply water, supplied from a facility, to a heat source inside said exposure apparatus;
a heat exchanger configured to perform heat exchange between a gas discharged out of said chamber by said circulation system and the water supplied to the heat source by said supplying system;
a temperature sensor for measuring a temperature of the water, at a position downstream of said heat exchanger and upstream of the heat source, with respect to the flow of water of said supplying system,
wherein said circulation system includes (i) a first path that extends through said heat exchanger, (ii) a second path that bypasses said heat exchanger, and (iii) a valve mechanism configured to adjust a flow amount of the gas passing through the first path; and
a controller for controlling said valve mechanism on the basis of a measurement made by said temperature sensor.