Amorphous silicon thin film transistor-liquid crystal display device and method of manufacturing the same
View Patent ↗In an amorphous silicon thin film transistor-liquid crystal display device and a method of manufacturing the same, gate patterns including a gate line and a gate electrode are formed on an insulation substrate having a display region and a driving circuit region on which a plurality of shift resistors are formed. A gate insulating film, active layer patterns and data patterns including source/drain electrodes are formed successively on the substrate. A passivation layer on the substrate has a first contact hole exposing a drain electrode of the display region and second and third contact holes respectively exposing a gate electrode and source/drain electrode of a first transistor of each of the shift resistors. Electrode patterns on the passivation layer include a first electrode connected to the drain electrode of the display region through the first contact hole and a second electrode connecting the gate electrode to the source/drain electrode of the first transistor through the second and third contact holes. The gate driving circuit including the shift resistors and the wirings are integrated on the insulating substrate without an additional process, thereby simplifying the manufacturing process.
1. An amorphous silicon thin film transistor-liquid crystal display device comprising:
an insulating substrate including a display region on which a plurality of gate lines and a plurality of data lines are formed, and a gate driving circuit region;
a plurality of shift registers formed on the gate driving circuit region of the substrate, said shift registers including a number of thin film transistors (TFTs) each having a gate electrode and source and drain electrodes, the shift registers for selecting a plurality of the gate lines successively;
main wirings disposed on the gate driving circuit region of the substrate for applying signals to each of the shift registers, the main wirings of the shift registers formed from a single layer;
a passivation layer formed on the substrate, the passivation layer having a first contact hole exposing a drain electrode in the display region, a second contact hole exposing a gate electrode of a first TFT of each of the shift registers in the gate driving circuit region and a third contact hole exposing source and drain electrodes of the first TFT in the gate driving circuit region;
electrode patterns formed on the passivation layer, the electrode patterns including a first electrode connected to the drain electrode in the display region through the first contact hole and a second electrode connecting the gate electrode and the data electrode through the second and third contact holes of the gate driving circuit region; and
branch wirings disposed on the driving circuit region of the substrate and crossing the main wirings to connect the main wirings to the TFT of each of the shift registers,
wherein the branch wirings are connected to the main wirings through third electrodes, and portions of the branch wirings overlapping the main wirings have line widths smaller than line widths of the main wirings.
2. The device as claimed in claim 1 , wherein the main wirings are formed from a different layer from the branch layer.
3. The device as claimed in claim 1 , wherein the gate electrode has a box shape and the source and drain electrodes are spaced apart from each other and alternately disposed.